以電子迴旋共振化學氣相沈積技術成長超薄閘極絕緣膜及可靠性之研究(II)

Title:	以電子迴旋共振化學氣相沈積技術成長超薄閘極絕緣膜及可靠性之研究(II) Fabrication and Reliability of Ultra-Thin Gate Dielectrics by ECR-CVD Technique (II)
Authors:	張國明 CHANG KOW-MING 國立交通大學電子工程學系
Keywords:	超薄閘極;可靠度;電子迴旋共振;化學氣相沈積法;介電薄膜;Ultra-thin gate;Reliability;Electron cyclotron resonance;Chemical vapor deposition (CVD);Dielectric thin film
Issue Date:	2001
Gov't Doc #:	NSC90-2215-E009-104
URI:	http://hdl.handle.net/11536/93462 https://www.grb.gov.tw/search/planDetail?id=665801&docId=126398
Appears in Collections:	Research Plans