| Title: | 氫化物氣相磊晶之側向蔓延磊晶技術之研究 Investigation of the Epitaxial Lateral Overgrowth by Hydride Vapor Phase Epitaxial Growth |
| Authors: | 施敏 SZE SIMON MIN 交通大學電子工程系 |
| Keywords: | 氫化物;選擇性成長;三五族化合物;側向蔓延成長;磊晶;Hydride;Selective growth;Ⅲ-V compound;Lateral overgrowth;Epitaxy |
| Issue Date: | 1999 |
| Gov't Doc #: | NSC88-2215-E009-038 |
| URI: | http://hdl.handle.net/11536/94235 https://www.grb.gov.tw/search/planDetail?id=417924&docId=74127 |
| Appears in Collections: | Research Plans |
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