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Title: 實用銅膜之化學氣相沈積技術研究
Study and Development of Practical Copper Film Deposition by CVD Method
Authors: 陳茂傑
交通大學電子工程系
Keywords: 化學氣相沈積法;銅膜;積體電路製造;CVD;Copper film;Integrated circuit fabrication
Issue Date: 2001
Gov't Doc #: NSC90-2215-E009-096
URI: http://hdl.handle.net/11536/94987
https://www.grb.gov.tw/search/planDetail?id=665788&docId=126395
Appears in Collections:Research Plans


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