Title: | 電子束微影近距效應校正參數求測 Determination of Proximity Correction Parameters for Electron Beam Lithography |
Authors: | 龍文安 Loong Wen-an 交通大學應用化學系 |
Keywords: | 電子束微影成像;近距效應;校正;參數;Electron beam lithography;Proximity effect;Correction;Parameter |
Issue Date: | 1998 |
Gov't Doc #: | NSC87-2215-E009-056 |
URI: | http://hdl.handle.net/11536/95090 https://www.grb.gov.tw/search/planDetail?id=409020&docId=72412 |
Appears in Collections: | Research Plans |