| Title: | 超大型積體電路多層配導線間含氟絕緣膜之開發研究 Development of Fluorinated Insulators for Multilevel Interconnection in VLSI |
| Authors: | 葉清發 國立交通大學電子工程學系 |
| Issue Date: | 1996 |
| Gov't Doc #: | NSC85-2215-E009-057 |
| URI: | http://hdl.handle.net/11536/96017 https://www.grb.gov.tw/search/planDetail?id=218528&docId=38690 |
| Appears in Collections: | Research Plans |
- 以電漿輔助化學氣相沈積低介電常數之含氟氧化物薄膜的化學機械研磨技術與材料特性研究 / 謝元智;Hsieh, Yuan-Tsu;馮明憲, 戴寶通;Feng Ming-Shiann, Dai Bau-Tong
- An empirical three-dimensional crossover capacitance model for multilevel interconnect VLSI circuits / Wong, SC;Lee, TGY;Ma, DJ;Chao, CJ
- 三維超大型積體電路多層連線的新模擬策略 / 侯信銘;Hou, Hsin-Ming;吳慶源;Ching-Yuan Wu
- Smart dielectrics of fluorinated silicon glass prepared by liquid phase deposition method / Yeh, CF;Chen, TF;Lee, YC;Liu, CH;Lin, SS
- Electrical enhancement of polycrystalline silicon thin-film transistors using fluorinated silicate glass passivation layer / Chang, Chia-Wen;Deng, Chih-Kang;Huang, Jiun-Jia;Wang, Tong-Yi;Lei, Tan-Fu
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