電極/鐵電薄膜/結緣層/矽晶體結構之薄膜製程及特性劣化研究

Title:	電極/鐵電薄膜/結緣層/矽晶體結構之薄膜製程及特性劣化研究 Characteristic Degradation and Processing Development of Ferroelectric-Film for Metal-Ferroelectric-Insulator-Semiconductor
Authors:	陳三元 CHEN SAN-YUAN 國立交通大學材料科學與工程學系
Keywords:	電極;鐵電薄膜;絕緣層;矽晶體;特性劣化;Electrode;Ferroelectric thin film;Insulating layer;Silicon crystal;Characterization degradation
Issue Date:	2001
Gov't Doc #:	NSC90-2215-E009-061
URI:	http://hdl.handle.net/11536/96874 https://www.grb.gov.tw/search/planDetail?id=665675&docId=126367
Appears in Collections:	Research Plans

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