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dc.contributor.authorHuang, Shen-Cheen_US
dc.contributor.authorHuang, Qiangshengen_US
dc.contributor.authorMa, Keqien_US
dc.contributor.authorZhang, Jianhaoen_US
dc.contributor.authorShi, Yaochengen_US
dc.contributor.authorDai, Daoxinen_US
dc.contributor.authorLu, Tien-Changen_US
dc.contributor.authorHe, Sailingen_US
dc.date.accessioned2017-04-21T06:48:26Z-
dc.date.available2017-04-21T06:48:26Z-
dc.date.issued2015en_US
dc.identifier.isbn978-1-4799-4208-4en_US
dc.identifier.issn2378-8593en_US
dc.identifier.urihttp://hdl.handle.net/11536/136064-
dc.description.abstractThe high contrast grating (HCG) mirror has been illustrated and characterized. The investigated parameters including grating periods and filling factors were calculated by finite-difference time-domain method. The two-dimension HCG was fabricated by electron-beam lithography and inductively coupled plasma process. The reflectivity of the fabricated HCG mirror was measured, resulting in around 200 nm bandwidth. The measured result also showed a good agreement with calculated one. This achievement was promising in developing the novel light emitters in the telecommunication region.en_US
dc.language.isoen_USen_US
dc.subjectgratingsen_US
dc.subjectsubwavelength structureen_US
dc.subjectnanostructure fabricationen_US
dc.subjectsilicon-on-insulatoren_US
dc.titleDesign, optimization and fabrication of two-dimension high contrast subwavelength grating (HCG) mirror on Silicon-on-insulatoren_US
dc.typeProceedings Paperen_US
dc.identifier.journal2015 International Symposium on Next-Generation Electronics (ISNE)en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000380530500094en_US
dc.citation.woscount0en_US
Appears in Collections:Conferences Paper