Photostabilization of an epoxy resin by forming interpenetrating polymer networks with bisphenol-A diacrylate

Abstract

Bisphenol-A diacrylate (BADA) was synthesized from the reaction of bisphenol-A and acrylol chloride. Interpenetrating polymer networks (IPNs) based on diglycidyl ether of bisphenol-A. (DGEBA) and BADA in weight ratios of DGEBA/BADA = 100/0, 75/25 and 50/50 were prepared by using 4,4'-diaminodiphenylmethane (MDA) and benzoyl peroxide (BPO) as curing agents. Samples were irradiated with ultraviolet in a Q-WA weather-o-meter to study their aging behavior. Experimental results indicated that the BADA thus incorporated in the IPN structure confers significant photostabilization of the epoxy, as shown by less chain scission at C-O-C in the epoxy, with less property loss in mechanical tests. (C) 1999 Elsevier Science Ltd. All rights reserved.