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dc.contributor.authorHuang, Chih-Fengen_US
dc.contributor.authorChen, Weien_US
dc.contributor.authorRussell, Thomas P.en_US
dc.contributor.authorBalazs, Anna C.en_US
dc.contributor.authorChang, Feng-Chihen_US
dc.contributor.authorMatyjaszewski, Krzysztofen_US
dc.date.accessioned2014-12-08T15:08:42Z-
dc.date.available2014-12-08T15:08:42Z-
dc.date.issued2009-09-22en_US
dc.identifier.issn1022-1352en_US
dc.identifier.urihttp://dx.doi.org/10.1002/macp.200900195en_US
dc.identifier.urihttp://hdl.handle.net/11536/6661-
dc.description.abstractA series of polystyrene-block-poly(n-butyl methacrylate) (PS-b-PnBMA) diblock copolymers (di-BCPs) with an azobenzene moiety [trans-4-methacryloyloxyazobenzene (MOAB)] in the PnBMA segment was prepared by atom transfer radical polymerization (ATRP). P(nBMA-co-MOAB) macroinitiators were prepared by activators regenerated by electron transfer (ARGET) ATRP. The MOAB was slightly more reactive than nBMA, resulting in a weak gradient fashion of copolymer. The macroinitiators were subsequently chain-extended with styrene. Acceleration of the ATRP rate was observed in the presence of a reducing agent. P(nBMA-co-MOAB)-b-PS di-BCPs were obtained with relatively narrow molecular weight distributions ((M) over bar (w)(M) over bar (n) = 1.16-1.49) and the molecular weights were in good agreement with the theoretical values. The efficiency of photoisomerization of the MOAB units was above 80%. DSC traces showed a single T(g) suggesting the block copolymers were miscible before UV irradiation. After UV irradiation, the X-ray reflectivity measurements showed the beating of two frequencies, indicating the formation of island-hole structure.en_US
dc.language.isoen_USen_US
dc.subjectARGET ATRPen_US
dc.subjectazobenzeneen_US
dc.subjectblock copolymersen_US
dc.subjectreflectivityen_US
dc.subjectX-rayen_US
dc.titleSynthesis of Photoisomerizable Block Copolymers by Atom Transfer Radical Polymerizationen_US
dc.typeArticleen_US
dc.identifier.doi10.1002/macp.200900195en_US
dc.identifier.journalMACROMOLECULAR CHEMISTRY AND PHYSICSen_US
dc.citation.volume210en_US
dc.citation.issue18en_US
dc.citation.spage1484en_US
dc.citation.epage1492en_US
dc.contributor.department應用化學系zh_TW
dc.contributor.departmentDepartment of Applied Chemistryen_US
dc.identifier.wosnumberWOS:000271612000002-
dc.citation.woscount7-
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