嵌附式減光型相移圖罩之模擬與製備

Title:	嵌附式減光型相移圖罩之模擬與製備 Simulation and Fabrication of Embedded Attenuated Phase-Shifting Mask
Authors:	龍文安 Loong Wen-an 交通大學應用化學系
Keywords:	相移光罩;活性離子蝕刻;電子束;微影術;步進機;Phase shift mask (PSM);Reactive ion etching (RIE);E-beam;Lithography;Stepper
Issue Date:	1999
Gov't Doc #:	NSC88-2215-E009-025
URI:	http://hdl.handle.net/11536/94241 https://www.grb.gov.tw/search/planDetail?id=418240&docId=74198
Appears in Collections:	Research Plans

APA	龍., & Loong W. (1999). 嵌附式減光型相移圖罩之模擬與製備. https://www.grb.gov.tw/search/planDetail?id=418240&docId=74198.
Bibtex	@article{1999, title={嵌附式減光型相移圖罩之模擬與製備}, author={龍文安 and Loong Wen-an}, journal={https://www.grb.gov.tw/search/planDetail?id=418240&docId=74198}, year={1999}, url={https://ir.lib.nycu.edu.tw/handle/11536/94241}, }