| 標題: | 嵌附式減光型相移圖罩之模擬與製備 Simulation and Fabrication of Embedded Attenuated Phase-Shifting Mask |
| 作者: | 龍文安 Loong Wen-an 交通大學應用化學系 |
| 關鍵字: | 相移光罩;活性離子蝕刻;電子束;微影術;步進機;Phase shift mask (PSM);Reactive ion etching (RIE);E-beam;Lithography;Stepper |
| 公開日期: | 1999 |
| 官方說明文件#: | NSC88-2215-E009-025 |
| URI: | http://hdl.handle.net/11536/94241 https://www.grb.gov.tw/search/planDetail?id=418240&docId=74198 |
| Appears in Collections: | Research Plans |
- 嵌附式減光式相移光罩之模擬與製備 / 龍文安;Loong Wen-an
- 以I-line相位移光罩微影成像技術作次微米T型閘的研究 / 傅國貴;David K. Fu;張翼;Edward Yi Chang
- 嵌附調細式相移光罩研製 / 龍文安;Loong Wen-an
- An etch back technique to achieve sub-micron T-gate for GaAsFETs using I-line stepper and phase shift mask (PSM) / Fu, DK;Chen, SH;Chang, HC;Chang, EY
- 嵌附減光式相移光罩吸光相移層研製 / 龍文安;Loong Wen-an
- 石英蝕刻調細式相移光罩之模擬與研製 / 林雍秩;Lin Yung-chih;龍文安;Dr.Loong Wen-an
- 193奈米微影用正規與高透射率嵌附層材料之探討及減光型相移圖罩應用之模擬 / 林政旻;Cheng-ming Lin;龍文安;Dr. Loong Wen-an
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