隨機記憶體用高介電薄膜電容之研發(III)

Title:	隨機記憶體用高介電薄膜電容之研發(III) High Dielectric Thin Film Capacitor for DRAM (III)
Authors:	林鵬 LIN PANG 交通大學材料科學與工程研究所
Keywords:	隨機動態存取記憶體;高介電常數;薄膜;電容器;濺鍍;DRAM;High dielectric constant;Thin film;Capacitor;Sputtering
Issue Date:	1999
Gov't Doc #:	NSC88-2215-E009-028
URI:	http://hdl.handle.net/11536/94453 https://www.grb.gov.tw/search/planDetail?id=444166&docId=80433
Appears in Collections:	Research Plans

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APA	林., & LIN P. (1999). 隨機記憶體用高介電薄膜電容之研發(III). https://www.grb.gov.tw/search/planDetail?id=444166&docId=80433.
Bibtex	@article{1999, title={隨機記憶體用高介電薄膜電容之研發(III)}, author={林鵬 and LIN PANG}, journal={https://www.grb.gov.tw/search/planDetail?id=444166&docId=80433}, year={1999}, url={https://ir.lib.nycu.edu.tw/handle/11536/94453}, }