Temperature Dependence of Breakdown Voltage in Silicon Abrupt p-n Junctions
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交大學刊編輯委員會
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Abstract
Temperature dependence of breakdowm voltage in silicon abrupt p+n junction has been calculated using a modified Baraff theory and measured experimentally from 77°K to 500°K, and with the substrate doping from 10^15 cm^-3 to 10^18 cm^-3. Experimental data are in good agreement with the results of the theoretical calculations. These results strongly substantiate the validity of the modified Baraff theory which has been pointed out by Sze and Cowwell.