Browsing by Author "Chan, Chien-Tai"

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Characteristics and physical mechanisms of positive bias and temperature stress-induced drain current degradation in HfSiON nMOSFETs
(2006-06-01)
Chan, Chien-Tai
;
Tang, Chun-Jung
;
Wang, Tahui
;
Wang, Howard C. -H.
;
Tang, Denny D.
Drain current degradation in HfSiON gate, dielectric nMOSFETs by positive gate bias and temperature stress is investigated by using a fast transient measurement technique. The degradation exhibits two stages, featuring a different degradation rate and stress temperature dependence. The first-stage degradation is attributed to the charging of preexisting high-k dielectric traps and has a log(t) dependence on stress time, whereas the second-stage degradation is mainly caused by new high-k trap creation. The high-k trap growth rate is characterized by two techniques, namely 1) a recovery transient technique and 2) a charge-pumping technique. Finally, the effect of processing on high-k trap growth is evaluated.