Browsing by Author "Chan, Yi-Jen"
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Item type:Item, Amorphous InGaZnO Thin-Film Transistors Compatible With Roll-to-Roll Fabrication at Room Temperature(2012-01-01) ;Yu, Ming-Jiue ;Yeh, Yung-Hui ;Cheng, Chun-Cheng ;Lin, Chang-YuHo, Geng-TaiHigh-performance amorphous InGaZnO (a-IGZO) thin-film transistors (TFTs) are successfully fabricated on a colorless polyimide substrate using a top-gate self-aligned structure. All thin films are deposited by roll-to-roll-compatible sputtering processes at room temperature. The maximum field-effect mobility is 18 cm(2)/V . s, the threshold voltage is - 1.35 V, the subthreshold slope is 0.1 V/decade, and the on/off current ratio is about 10(5). The results highlight that excellent device performance can be realized in a-IGZO TFTs without compromising manufacturability.Item type:Item, Au Nanoparticle Light Scattering Enhanced Responsivity in Pentacene Phototransistor for Deep-UV Light Detection(2015-11-01) ;Yuan, Shuo-Huang ;Pei, Zingway ;Lai, Hsin-Cheng ;Chen, Chien-HsunLi, Pei-WenIn this letter, a pentacene thin-film phototransistor (PTFP) with gold nanoparticles (Au-NPs) decoration in bottom-gate structure was demonstrated. With the Au-NPs, this device is capable of scattering the free-space ultra-violet (UV) irradiation into the pentacene film. Therefore, the PTFP with Au-NPs exhibit 4.5-A/W responsivity with V-GS = 0 V at the wavelength of 240 nm. Meanwhile, an ultimate 32.4-A/W responsivity can be achieved with V-GS = -10 V at the wavelength of 240 nm. Such an excellent spectral response suggests PTFP is capable for used in daily and disposable UV status assessment.Item type:Item, Influence of thin metal base thickness on the performance of CuPc vertical organic triodes(2007-04-09) ;Cheng, Shiau-Shin ;Yang, Chuan-Yi ;Chuang, You-Che ;Ou, Chun-WeiWu, Meng-ChyiIn this letter, the characteristics of vertical organic triodes fabricated by using two copper phthalocyanine (CuPc) back-to-back Schottky diodes with different metal base thicknesses are reported. The vertical organic triodes exhibit pronounced saturation regions in the output current-voltage characteristics. The common-emitter current gain reduces with increasing the Al base thickness due to the increase of recombination current at the base end resulted from the reduction of opening voids in the Al metal film. The common-emitter current gain of the device with 4.5 nm thick Al base reaches 1.9 at V-CE=-6 V and J(B)=2.5 mA/cm(2). (c) 2007 American Institute of Physics.