Browsing by Author "Chang, PJ"

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Chemical vapor deposition of tantalum carbide and carbonitride thin films from Me3CE=Ta(CH2CMe3)(3) (E = CH, N)
(2003)
Chang, YH
;
Wu, JB
;
Chang, PJ
;
Chiu, HT
;
應用化學系
Chemical vapor deposition (CVD) of thin films employing Me3CCH=Ta(CH2CMe3)(3) and Me3CN=Ta(CH2CMe3)(3) as the precursors has been carried out. TaC and TaCN films were deposited at relatively low temperatures (623-923 K). In comparison, using Me3CN=Ta(CH2CMe3)(3), the Ta=N bond did not undergo cleavage during the reaction and the N atom was incorporated into the film as nitride. The volatile components evolved were collected and examined by GC-MS, FT-IR, H-1 and C-13 NMR spectroscopy. Possible decomposition pathways of the tantalum complexes are proposed to rationalize the observation.
Correlation between N 1s XPS binding energy and bond distance in metal amido, imido, and nitrido complexes
(2003-07-28)
Wu, JB
;
Lin, YF
;
Wang, JL
;
Chang, PJ
;
Tasi, CP
Synchrotron-based X-ray photoelectron spectroscopy is used to measure N 1s binding energies of several metal amido, imido, and nitrido complexes of group 5 and 6 metals. The N 1s binding energy decreases as the formal M-N bond order increases. A simple correlation between the contraction of the M-N bond and the lowering of binding energy is also observed. This correlation supports a notion that the bonding character of a linear metal-imido linkage resembles that of a metal-nitrido linkage closely.
Metallo-organic chemical vapor deposition of tantalum carbide and tantalum nitride thin films from (BuCH)-Bu-t=Ta(CH2 Bu-t)(3) and (BuN)-Bu-t=Ta(CH2 Bu-t)(3).
(2002-04-07)
Chiu, HT
;
Chang, YH
;
Chang, PJ
;
Wu, JB
;
Peng, SM