Browsing by Author "Chen, Hsin-Ying"

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Investigation of Microwave Assisted Annealing on AP-PECVD Fabricated In-Ga-Zn-O Thin Film Transistors under Positive Bias Temperature Stress
(2016)
Wu, Chien-Hung
;
Huang, Bo-Wen
;
Chang, Kow-Ming
;
Cheng, Chia-Yao
;
Chen, Hsin-Ying
In this paper, microwave assisted annealing (MWAA) technique on atmospheric pressure plasma-enhanced chemical vapor deposition (AP-PECVD) fabricated indium-gallium-zinc-oxide thin-film transistors (IGZO TFTs) is investigated for the first time. MWAA with 300W for 100sec treatment on AP-IGZO TFTs have been fabricated successfully and show excellent electrical characteristics including a VTH of -1.23 V, SS of 0.18 V/dec, mu FE of 17.4 cm2/V-s, and Ion/Ioff ratio of 8.14 106. Stretched exponential time dependence model is used to analyze the mechanism of AP-IGZO TFTs under PBTI stress. Accordingly, chemisorption model for oxygen adsorption at AP-IGZO backchannel with and without MWAA is proposed to explain the mechanism under PBTI stress.
The Investigation for In-Ga-Zn-O TFTs with Post Deposition of in-situ Ar/H-2 Plasma Treatment by Atmospheric Pressure Plasma Jet
(2016)
Chang, Kow-Ming
;
Huang, Bo-Wen
;
Wu, Chien-Hung
;
Chen, Hsin-Ying
;
Zheng, You-Xian
Atmospheric pressure plasma-enhanced chemical vapor deposition (AP-PECVD) was applied for the fabrication of amorphous indium gallium zinc oxide thin-film transistors (a-IGZO TFTs). In this work, a-IGZO TFTs fabricated by AP-PECVD technique were firstly treated by post deposition of in-situ Ar/H-2 plasma with atmospheric pressure plasma Jet (APPJ). Compared to without plasma treatment, samples with the post in-situ Ar/H-2 plasma treatment on IGZO active layer exhibited higher mobility of 20.12 cm(2)/V.S, V-T of 1.11 V, lower subthreshold swing of 93 mV/decade, higher I-on/I-off of 5.34x10(7). The excellent IGZO TFTs fabricated by AP-PECVD technique also show highly transparent characteristics.