Browsing by Author "Chen, Hsiu-Ying"
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Item type:Item, Growth and photoresponse study of PdO nanoflakes reactive-sputter deposited on SiO(2)(2010-09-01) ;Huang, Chien-Jung ;Pan, Fu-Ming ;Chen, Hsiu-Ying ;Li-Chang材料科學與工程學系This study prepares PdO nanostructures on a SiO(2) substrate by reactive-sputter deposition and examines photoresponse characteristics of the thin films. PdO thin films deposited at 25 degrees C is composed of bowed nanoflakes standing on the SiO(2) substrate, which have a single-crystalline structure after thermal anneal at 400 degrees C. The 400 degrees C-annealed nanoflake thin film has a band gap energy in the red-light range (similar to 2.06 eV), and exhibits a very sensitive photoresponse upon the UV (365 nm) illumination. The high photoresponse sensitivity of the 400 degrees C-annealed nanoflake thin film is ascribed to a lower density of recombination centers and traps due to an excellent crystallinity and a high carrier extraction efficiency due to a low electrical resistivity. A slight decrease in the photocurrent density during the initial stage of the UV illumination is attributed to adsorption of O(2)(-) anions on the 400 degrees C-annealed nanoflakes. (C) 2010 American Institute of Physics. [doi: 10.1063/1.3476567]Item type:Item, Growth and photoresponse study of PdO nanoflakes reactive-sputter deposited on SiO2(2010-09-01) ;Huang, Chien-Jung ;Pan, Fu-Ming ;Chen, Hsiu-Ying ;Li-Chang材料科學與工程學系This study prepares PdO nanostructures on a SiO2 substrate by reactive-sputter deposition and examines photoresponse characteristics of the thin films. PdO thin films deposited at 25 degrees C is composed of bowed nanoflakes standing on the SiO2 substrate, which have a single-crystalline structure after thermal anneal at 400 degrees C. The 400 degrees C-annealed nanoflake thin film has a band gap energy in the red-light range (similar to 2.06 eV), and exhibits a very sensitive photoresponse upon the UV (365 nm) illumination. The high photoresponse sensitivity of the 400 degrees C-annealed nanoflake thin film is ascribed to a lower density of recombination centers and traps due to an excellent crystallinity and a high carrier extraction efficiency due to a low electrical resistivity. A slight decrease in the photocurrent density during the initial stage of the UV illumination is attributed to adsorption of O-2(-) anions on the 400 degrees C-annealed nanoflakes. (C) 2010 American Institute of Physics. [doi: 10.1063/1.3476567]