Browsing by Author "Chen, Jun-Ming"
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Item type:Item, Periostin promotes epithelial-mesenchymal transition via the MAPK/miR-381 axis in lung cancer(2017-09-05) ;Hu, Wei-Wei ;Chen, Po-Chun ;Chen, Jun-Ming ;Wu, Yue-MingLiu, Po-YiPeriostin (POSTN, PN, or osteoblast-specific factor OSF-2) is a multifunctional cytokine that signals between the cell and the extracellular matrix. Periostin plays an important role in tumor development and is involved in carcinoma cell epithelial-mesenchymal transition (EMT), whereby mature epithelial cells undergo phenotypic morphological changes and become invasive, motile cells. Here, we discuss the molecular mechanisms involved in periostin-induced promotion of EMT in lung cancer cells. Online TCGA datasets demonstrate the prognostic relevance of periostin in lung cancer; a higher periostin level correlates with poor overall survival. Similarly, our IHC results show that high periostin expression is positively correlated with the EMT markers Snail and Twist, as well as stage of lung cancer. We found that recombinant periostin induces the EMT phenotype in lung cancer cells through the p38/ERK pathway, while pretreatment with chemical inhibitors prevented periostin-induced EMT induction. Moreover, we found that periostin regulates EMT by repressing microRNA-381 (miR-381) expression, which targets both Snail and Twist. Using the miR-381 mimic, we dramatically reversed periostin-induced Snail and Twist expression. Furthermore, periostin knockdown dramatically affected EMT markers and cell migration potential. The role of periostin in lung cancer progression is elucidated by the in vivo mouse model. Our findings indicate that changes in periostin expression in lung cancer may serve as a therapeutic target for the treatment of lung cancer metastasis.Item type:Item, The roles of hydrophobic group on the surface of ultra low dielectric constant porous silica film during thermal treatment(2007-06-25) ;Luo, Jen-Tsung ;Wu, Wen-Fa ;Wen, Hua-Chiang ;Wan, Ben-ZuChang, Yu-MingPorous silica films with ultra low-k (below 2) and low leakage current densities (10(-8) A/cm(2) or lower at an electric field of 1.8 MV/cm) were prepared by the surfactant-template method. Hexamethyldisilazane (HMDS), a surface modification agent, was utilized to yield hydrophobic groups on the surface of porous silica film to prevent the absorption of moisture. It effectively retained the low permittivity properties of the films. Thermal treatment at high temperature (> 350 degrees C) destroyed surface hydrophobic groups and generated hydrophilic groups (Si-OH), which replaced the surface Si(CH3)(3) groups, and resulted in the absorption of moisture. However, Si-OH not only resulted in the absorption of moisture but also initiated the formation of trimethylsilyl groups on the surface by HMDS. When the damaged film is repaired by HMDS again, the k value falls to its initial value (which may be below 1.6). A denser hydrophobic low-k film is formed and the electrical properties are improved. (C) 2007 Elsevier B.V. All rights reserved.