Browsing by Author "Chen, Tse-An"

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Ledge-directed epitaxy of continuously self-aligned single-crystalline nanoribbons of transition metal dichalcogenides
(1970-01-01)
Aljarb, Areej
;
Fu, Jui-Han
;
Hsu, Chih-Chan
;
Chuu, Chih-Piao
;
Wan, Yi
Two-dimensional transition metal dichalcogenide nanoribbons are touted as the future extreme device downscaling for advanced logic and memory devices but remain a formidable synthetic challenge. Here, we demonstrate a ledge-directed epitaxy (LDE) of dense arrays of continuous, self-aligned, monolayer and single-crystalline MoS(2)nanoribbons on beta-gallium (iii) oxide (beta-Ga2O3) (100) substrates. LDE MoS(2)nanoribbons have spatial uniformity over a long range and transport characteristics on par with those seen in exfoliated benchmarks. Prototype MoS2-nanoribbon-based field-effect transistors exhibit high on/off ratios of 10(8)and an averaged room temperature electron mobility of 65 cm(2) V-1 s(-1). The MoS(2)nanoribbons can be readily transferred to arbitrary substrates while the underlying beta-Ga(2)O(3)can be reused after mechanical exfoliation. We further demonstrate LDE as a versatile epitaxy platform for the growth of p-type WSe(2)nanoribbons and lateral heterostructures made of p-WSe(2)and n-MoS(2)nanoribbons for futuristic electronics applications. Aligned arrays of single-crystalline monolayer TMD nanoribbons with high aspect ratios, as well as their lateral heterostructures, are realized, with the growth directed by the ledges on the beta-Ga(2)O(3)substrate. This approach provides an epitaxy platform for advanced electronics applications of TMD nanoribbons.
Regiocontrolled Synthesis of Ethene-Bridged para-Phenylene Oligomers Based on Pt(II)- and Ru(II)-Catalyzed Aromatization
(2010-01-01)
Chen, Tse-An
;
Lee, Te-Ju
;
Lin, Ming-Yuan
;
Sohel, Shariar M. A.
;
Dian, Eric Wei-Guang
We report the regiocontrolled syntheses of ethene-bridged para-phenylene oligomers in three distinct classes by using Pt(II)- and Ru(II)-catalyzed aromatization. This synthetic approach has been developed based on twofold aromatization of the 1-aryl-2-alkynyl-benzene functionality, which proceeds by distinct regioselectivity for platinum and ruthenium catalysts. Variable-temperature NMR spectra provide evidence that large arrays of these oligomers are prone to twist from planarity. The UV/Vis and photoluminescence (PL) spectra as well as the band gaps of these regularly growing arrays show a pattern of extensive pi conjugation with increasing array sizes, except for in one instance.
Regiocontrolled Synthesis of Ethene-Bridged para-Phenylene Oligomers Based on Pt-II- and Ru-II-Catalyzed Aromatization
(2010-01-01)
Chen, Tse-An
;
Lee, Te-Ju
;
Lin, Ming-Yuan
;
Sohel, Shariar M. A.
;
Dian, Eric Wei-Guang
We report the regiocontrolled syntheses of ethene-bridged para-phenylene oligomers in three distinct classes by using Pt-II- and Ru-II-catalyzed aromatization. This synthetic approach has been developed based on twofold aromatization of the 1-aryl-2-alkynyl-benzene functionality, which proceeds by distinct regioselectivity for platinum and ruthenium catalysts. Variable-temperature NMR spectra provide evidence that large arrays of these oligomers are prone to twist from planarity. The UV/Vis and photoluminescence (PL) spectra as well as the band gaps of these regularly growing arrays show a pattern of extensive pi conjugation with increasing array sizes, except for in one instance.
Wafer-scale single-crystal hexagonal boron nitride monolayers on Cu (111)
(2020-03-01)
Chen, Tse-An
;
Chuu, Chih-Piao
;
Tseng, Chien-Chih
;
Wen, Chao-Kai
;
Wong, H. -S. Philip
Ultrathin two-dimensional (2D) semiconducting layered materials offer great potential for extending Moore's law of the number of transistors in an integrated circuit(1). One key challenge with 2D semiconductors is to avoid the formation of charge scattering and trap sites from adjacent dielectrics. An insulating van der Waals layer of hexagonal boron nitride (hBN) provides an excellent interface dielectric, efficiently reducing charge scattering(2,3). Recent studies have shown the growth of single-crystal hBN films on molten gold surfaces(4) or bulk copper foils(5). However, the use of molten gold is not favoured by industry, owing to its high cost, cross-contamination and potential issues of process control and scalability. Copper foils might be suitable for roll-to-roll processes, but are unlikely to be compatible with advanced microelectronic fabrication on wafers. Thus, a reliable way of growing single-crystal hBN films directly on wafers would contribute to the broad adoption of 2D layered materials in industry. Previous attempts to grow hBN monolayers on Cu (111) metals have failed to achieve mono-orientation, resulting in unwanted grain boundaries when the layers merge into films(6,7). Growing single-crystal hBN on such high-symmetry surface planes as Cu (111)(5,8) is widely believed to be impossible, even in theory. Nonetheless, here we report the successful epitaxial growth of single-crystal hBN monolayers on a Cu (111) thin film across a two-inch c-plane sapphire wafer. This surprising result is corroborated by our first-principles calculations, suggesting that the epitaxial growth is enhanced by lateral docking of hBN to Cu (111) steps, ensuring the mono-orientation of hBN monolayers. The obtained single-crystal hBN, incorporated as an interface layer between molybdenum disulfide and hafnium dioxide in a bottom-gate configuration, enhanced the electrical performance of transistors. This reliable approach to producing wafer-scale single-crystal hBN paves the way to future 2D electronics.
Wafer-scale single-crystal hexagonal boron nitride monolayers on Cu (111)
(1970-01-01)
Chen, Tse-An
;
Chuu, Chih-Piao
;
Tseng, Chien-Chih
;
Wen, Chao-Kai
;
Wong, H. -S. Philip
The epitaxial growth of single-crystal hexagonal boron nitride monolayers on a copper (111) thin film across a sapphire wafer suggests a route to the broad adoption of two-dimensional layered semiconductor materials in industry. Ultrathin two-dimensional (2D) semiconducting layered materials offer great potential for extending Moore's law of the number of transistors in an integrated circuit(1). One key challenge with 2D semiconductors is to avoid the formation of charge scattering and trap sites from adjacent dielectrics. An insulating van der Waals layer of hexagonal boron nitride (hBN) provides an excellent interface dielectric, efficiently reducing charge scattering(2,3). Recent studies have shown the growth of single-crystal hBN films on molten gold surfaces(4) or bulk copper foils(5). However, the use of molten gold is not favoured by industry, owing to its high cost, cross-contamination and potential issues of process control and scalability. Copper foils might be suitable for roll-to-roll processes, but are unlikely to be compatible with advanced microelectronic fabrication on wafers. Thus, a reliable way of growing single-crystal hBN films directly on wafers would contribute to the broad adoption of 2D layered materials in industry. Previous attempts to grow hBN monolayers on Cu (111) metals have failed to achieve mono-orientation, resulting in unwanted grain boundaries when the layers merge into films(6,7). Growing single-crystal hBN on such high-symmetry surface planes as Cu (111)(5,8) is widely believed to be impossible, even in theory. Nonetheless, here we report the successful epitaxial growth of single-crystal hBN monolayers on a Cu (111) thin film across a two-inch c-plane sapphire wafer. This surprising result is corroborated by our first-principles calculations, suggesting that the epitaxial growth is enhanced by lateral docking of hBN to Cu (111) steps, ensuring the mono-orientation of hBN monolayers. The obtained single-crystal hBN, incorporated as an interface layer between molybdenum disulfide and hafnium dioxide in a bottom-gate configuration, enhanced the electrical performance of transistors. This reliable approach to producing wafer-scale single-crystal hBN paves the way to future 2D electronics.