Browsing by Author "Chen, Yuxuan"

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Analysis of the back-barrier effect in AlGaN/GaN high electron mobility transistor on free-standing GaN substrates
(2020-01-25)
Liu, Xinke
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Wang, Hao-Yu
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Chiu, Hsien-Chin
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Chen, Yuxuan
;
Li, Dabing
The effect of AlGaN back-barrier on AlGaN/GaN high electron mobility transistors (HEMTs) using freestanding GaN wafer has been investigated in this work. With the introducing back-barrier structure, the leakage path underneath the buffer (native nitrogen-vacancies and GaOx compounds of the HVPE-grown free-standing GaN surface) layer can be suppressed by lift-up the conduction band. As compared with AlGaN/GaN HEMTs on SiC wafer, AlGaN/GaN HEMTs on free-standing GaN wafer show enhanced drain current ( 700 mA/mm), improved transconductance (143 mS/mm), less current collapse (12%), higher current gain cut-off frequency (13 GHz), and maximum stable gain cut-off frequency (24 GHz), which is attributed to the higher epi quality layer on free-standing GaN wafer. (C) 2019 Elsevier B.V. All rights reserved.
Nearly lattice-matched molybdenum disulfide/gallium nitride heterostructure enabling high-performance phototransistors
(2019-03-01)
Liu, Xinke
;
Chen, Yuxuan
;
Li, Dabing
;
Wang, Sheng-Wen
;
Ting, Chao-Cheng
Molybdenum disulfide (MoS2)-based phototransistors are attractive for optical electronics in a large-scale size, such as transparent touch screens. However, most of the work done over the past decade has been on an opaque SiO2/Si wafer with a small size (micrometer to millimeter). In this work, a large-scale multilayer MoS2-based phototransistor has been fabricated on a transparent freestanding gallium nitride (GaN) wafer using a scalable chemical vapor deposition method. Due to the near lattice match and small thermal expansion mismatch between GaN and MoS2, the as-grown multilayer MoS2-on-GaN film shows high material quality in terms of low full width at half-maximum (similar to 5.16 cm(-1)) for the E-2g(1) Raman mode and a high absorption coefficient (similar to 10(6) cm(-1)) in the wavelength range of 405-638 nm. Under a wavelength of 405 nm at an incident power of 2 mWand applied voltage of 9 V, the fabricated MoS2-on-GaN phototransistor achieved a maximum responsivity of 17.2 A/W, a photocurrent gain of 53.6, and an external quantum efficiency of 5289%, with specific detectivity (similar to 10(10)-10(12) Jones) and low noise equivalent power (10(-12)-10(-14) W/Hz(1/2)) in the visible range of 405-638 nm. A typical response time of 0.1-4 s in the ambient air has also been recorded for the demonstrated MoS2-on-GaN phototransistor. Our work paves a technologic stepping stone for MoS2-based phototransistors for multifunctional transparent and touch-based optoelectronics in the future. (C) 2019 Chinese Laser Press