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Browsing by Author "Cheon, Hwan-Sung"

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    Use of Spin-On-Hard Mask Materials for nano scale patterning technology
    (2008)
    Wu, Wen-Hao
    ;
    Chang, Edward Y.
    ;
    Cheon, Hwan-Sung
    ;
    Kim, Sang Kyun
    ;
    Cho, Hyeon Mo
    Amorphous Carbon Layer (ACL) and SiON system has been proven to be a good hardmask combination. These layers are formed by a high cost, low throughput CVD process. This paper discloses a reliable, low cost, high throughput process using a simple spin on layer structure. Through manipulation of various parameters, additional BARC layer is eliminated and the process is further simplified to a tri-layer structure. Also, PR/SiON/C-SOH (Carbon-Spin-On-Hardmask) system has been compared to PR / Si-SOH (Si-Spin-On-Hardmask) / C-SOH system and found their performances are comparable. This indicates the PR / Si-SOH / C-SOH process is an economical yet comparable substitute.