Browsing by Author "Chiu, Ching-Hsueh"

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Advantages of Blue LEDs With Graded-Composition AlGaN/GaN Superlattice EBL
(2013-11-01)
Lin, Bing-Cheng
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Chen, Kuo-Ju
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Han, Hau-Vei
;
Lan, Yu-Pin
;
Chiu, Ching-Hsueh
InGaN/GaN light-emitting diodes (LEDs) with graded-composition AlGaN/GaN superlattice (SL) electron blocking layer (EBL) were designed and grown by metal-organic chemical vapor deposition. The simulation results demonstrated that the LED with a graded-composition AlGaN/GaN SL EBL have superior hole injection efficiency and lower electron leakage over the LED with a conventional AlGaN EBL or normal AlGaN/GaN SL EBL. Therefore, the efficiency droop can be alleviated to be similar to 20% from maximum at an injection current of 15-120 mA, which is smaller than that for conventional AlGaN EBL (30%). The corresponding experimental results also confirm that the use of a graded-composition AlGaN/GaN SL EBL can markedly enhance the light output power by 60%.
Design and Fabrication of the Reliable GaN Based Vertical-Cavity Surface-Emitting Laser via Tunnel Junction
(2019-04-01)
Shen, Chih-Chiang
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Lu, Yun-Ting
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Yeh, Yen-Wei
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Chen, Cheng-Yuan
;
Chen, Yu-Tzu
In this study, we theoretically designed and experimentally fabricated an InGaN vertical-cavity surface-emitting laser (VCSEL) with a tunnel junction (TJ) structure. From numerical simulation results, the optical loss of the device can be reduced by a TJ structure. Additionally, the leakage current of the VCSEL with TJ structure was much smaller than that of the VCSEL with an Indium-Tin-Oxide (ITO) layer. We have been demonstrated that laser output performance is improved by using the TJ structure when compared to the typical VCSEL structure of the ITO layer. The output power obtained at 2.1 mW was enhanced by a factor of 3.5 by the successful reduction of threshold current density (J(th)) from 12 to 8.5 kA/cm(2), and the enlarged slope efficiency was due to less absorption in VCSEL with a TJ structure. Finally, the samples passed the high temperature (70 degrees C) and high operation current (1.5 x J(th)) test for over 500 h.
Design, Modeling, and Fabrication of High-Speed VCSEL with Data Rate up to 50 Gb/s
(2019-08-14)
Shen, Chih-Chiang
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Hsu, Tsung-Chi
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Yeh, Yen-Wei
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Kang, Chieh-Yu
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Lu, Yun-Ting
We have studied the characteristics of frequency response at 850-nm GaAs high-speed vertical-cavity surface-emitting lasers (VCSELs) with different kinds of oxide aperture sizes and cavity length using the PICS3D simulation program. Using 5-mu m oxide aperture sizes, the frequency response behavior can be improved from 18.4 GHz and 15.5 GHz to 21.2 GHz and 19 GHz in a maximum of 3 dB at 25 degrees C and 85 degrees C, respectively. Numerical simulation results also suggest that the frequency response performances improved from 21.2 GHz and 19 GHz to 30.5 GHz and 24.5 GHz in a maximum of 3 dB at 25 degrees C and 85 degrees C due to the reduction of cavity length from 3 lambda/2 to lambda/2. Consequently, the high-speed VCSEL devices were fabricated on a modified structure and exhibited 50-Gb/s data rate at 85 degrees C.
Effect of the surface-plasmon-exciton coupling and charge transfer process on the photoluminescence of metal-semiconductor nanostructures
(2013)
Yin, Jun
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Yue, Chuang
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Zang, Yashu
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Chiu, Ching-Hsueh
;
Li, Jinchai
The effect of direct metal coating on the photoluminescence (PL) properties of ZnO nanorods (NRs) has been investigated in detail in this work. The direct coating of Ag nanoparticles (NPs) induces remarkable enhancement of the surface exciton (SX) emissions from the ZnO NRs. Meanwhile, the charge transfer process between ZnO and Ag also leads to notable increment of blue and violet emissions from Zn interstitial defects. A thin SiO2 blocking layer inserted between the ZnO and Ag has been demonstrated to be able to efficiently suppress the defect emission enhancement caused by the direct contact of metal-semiconductor, without weakening the surface-plasmon-exciton coupling effect. A theoretical model considering the type of contacts formed between metals, ZnO and blocking layer is proposed to interpret the change of the PL spectra.
Efficiency improvement of GaN-based ultraviolet light-emitting diodes with reactive plasma deposited AlN nucleation layer on patterned sapphire substrate
(2014-09-16)
Lee, Chia-Yu
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Tzou, An-Jye
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Lin, Bing-Cheng
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Lan, Yu-Pin
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Chiu, Ching-Hsueh
The flip chip ultraviolet light-emitting diodes (FC UV-LEDs) with a wavelength of 365 nm are developed with the ex situ reactive plasma deposited (RPD) AlN nucleation layer on patterned sapphire substrate (PSS) by an atmospheric pressure metal-organic chemical vapor deposition (AP MOCVD). The ex situ RPD AlN nucleation layer can significantly reduce dislocation density and thus improve the crystal quality of the GaN epitaxial layers. Utilizing high-resolution X-ray diffraction, the full width at half maximum of the rocking curve shows that the crystalline quality of the epitaxial layer with the (RPD) AlN nucleation layer is better than that with the low-temperature GaN (LT-GaN) nucleation layer. The threading dislocation density (TDD) is estimated by transmission electron microscopy (TEM), which shows the reduction from 6.8 x 10(7) cm(-2) to 2.6 x 10(7) cm(-2). Furthermore, the light output power (LOP) of the LEDs with the RPD AlN nucleation layer has been improved up to 30 % at a forward current of 350 mA compared to that of the LEDs grown on PSS with conventional LT-GaN nucleation layer.
Enhanced Performance of GaN-based Ultraviolet Light Emitting Diodes by Photon Recycling Using Graphene Quantum Dots
(2017-08-02)
Lin, Tzu-Neng
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Santiago, Svette Reina Merden
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Yuan, Chi-Tsu
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Chiu, Kuo-Pin
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Shen, Ji-Lin
ablation. The synthesized GQDs can improve the optical and electrical properties of InGaN/InAlGaN UV light emitting diodes (LEDs) remarkably. An enhancement of electroluminescence and a decrease of series resistance of LEDs were observed after incorporation of GQDs on the LED surface. As the GQD concentration is increased, the emitted light (series resistance) in the LED increases (decreases) accordingly. The light output power achieved a maximum increase as high as 71% after introducing GQDs with the concentration of 0.9 mg/ml. The improved performance of LEDs after the introduction of GQDs is explained by the photon recycling through the light extraction from the waveguide mode and the carrier transfer from GQDs to the active layer.
Enhanced power conversion efficiency in InGaN-based solar cells via graded composition multiple quantum wells
(2015-11-30)
Tsai, Yu-Lin
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Wang, Sheng-Wen
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Huang, Jhih-Kai
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Hsu, Lung-Hsing
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Chiu, Ching-Hsueh
This work demonstrates the enhanced power conversion efficiency (PCE) in InGaN/GaN multiple quantum well (MQWs) solar cells with gradually decreasing indium composition in quantum wells (GQWs) toward p-GaN as absorber. The GQW can improve the fill factor from 42% to 62% and enhance the short current density from 0.8 mA/cm(2) to 0.92 mA/cm(2), as compares to the typical MQW solar cells. As a result, the PCE is boosted from 0.63% to 1.11% under AM1.5G illumination. Based on simulation and experimental results, the enhanced PCE can be attributed to the improved carrier collection in GQW caused by the reduction of potential barriers and piezoelectric polarization induced fields near the p-GaN layer. The presented concept paves a way toward highly efficient InGaN-based solar cells and other GaN-related MQW devices. (C) 2015 Optical Society of America
Growth of semi-polar GaN-based light-emitting diodes grown on an patterned Si substrate
(2011)
Chiu, Ching-Hsueh
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Lin, Da-Wei
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Li, Zhen-Yu
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Ling, Shih-Chun
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Kuo, Hao-Chung
We present a study of semi-polar (1 (1) over bar 01) InGaN-based light emitting diodes (LEDs) grown on patterned (001) Si substrates by atmospheric-pressure metal organic chemical vapor deposition. A transmission electron microscopy image of the semi-polar template shows that the threading dislocation density was decreased significantly. From electroluminescence measurement, semi-polar LEDs exhibit little blue-shift and low efficiency droop at a high injection current because the reduction of the polarization field not only made the band diagram smoother but also restricted electron overflow to the p-GaN layer as shown in simulations. These results indicate that semi-polar InGaN-based LEDs can possess a high radiative recombination rate and low efficiency droop at a high injection current.
High Efficiency GaN-based Light Emitting Diodes with Embedded Air Voids/SiO2 Nanomasks
(2012-01-01)
Chiu, Ching-Hsueh
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Lin, Chien-Chung
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Han, Hau-Vei
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Lin, Da-Wei
;
Chen, Yan-Hao
We fabricated high efficiency LEDs with embedded micro-scale air voids and SiO2 nanomask exhibit smaller reverse-bias current and great enhancement of the light output (65% at 20mA) compared with the conventional LEDs.
High efficiency GaN-based light-emitting diodes with embedded air voids/SiO(2) nanomasks
(2012-02-03)
Chiu, Ching-Hsueh
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Lin, Chien-Chung
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Han, Hau-Vei
;
Liu, Che-Yu
;
Chen, Yan-Hao
In this paper, the high performance GaN-based light-emitting diodes (LEDs) with embedded microscale air voids and an SiO(2) nanomask by metal-organic chemical vapor deposition (MOCVD) were demonstrated. Microscale air voids and an SiO(2) nanomask were clearly observed at the interface between GaN nanorods (NRs) and the overgrown GaN layer by scanning electron microscopy (SEM). From the reflectance spectra we show strong reflectance differences due to the different refractive index gradient between the GaN grown on the nanotemplate and sapphire. It can increase the light extraction efficiency due to additional light scattering. The transmission electron microscopy (TEM) images show the threading dislocations were suppressed by nanoscale epitaxial lateral overgrowth (NELOG). The LEDs with embedded microscale air voids and an SiO(2) nanomask exhibit smaller reverse-bias current and large enhancement of the light output (65% at 20 mA) compared with conventional LEDs.
High efficiency GaN-based light-emitting diodes with embedded air voids/SiO2 nanomasks
(2012-02-03)
Chiu, Ching-Hsueh
;
Lin, Chien-Chung
;
Han, Hau-Vei
;
Liu, Che-Yu
;
Chen, Yan-Hao
In this paper, the high performance GaN-based light-emitting diodes (LEDs) with embedded microscale air voids and an SiO2 nanomask by metal-organic chemical vapor deposition (MOCVD) were demonstrated. Microscale air voids and an SiO2 nanomask were clearly observed at the interface between GaN nanorods (NRs) and the overgrown GaN layer by scanning electron microscopy (SEM). From the reflectance spectra we show strong reflectance differences due to the different refractive index gradient between the GaN grown on the nanotemplate and sapphire. It can increase the light extraction efficiency due to additional light scattering. The transmission electron microscopy (TEM) images show the threading dislocations were suppressed by nanoscale epitaxial lateral overgrowth (NELOG). The LEDs with embedded microscale air voids and an SiO2 nanomask exhibit smaller reverse-bias current and large enhancement of the light output (65% at 20 mA) compared with conventional LEDs.
High Q microcavity light emitting diodes with buried AlN current apertures
(2011-07-25)
Cheng, Bo-Siao
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Wu, Yun-Lin
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Lu, Tien-Chang
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Chiu, Ching-Hsueh
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Chen, Cheng-Hung
We demonstrate a GaN-based high-Q microcavity light emitting diode (MCLED) with a buried AlN current aperture. A thin AlN layer is inserted on the InGaN/GaN multiple quantum wells as a current blocking layer and an optical confinement layer. The GaN-based MCLED is composed of a 29-pair GaN/AlN distributed Bragg reflector (DBR), an eight-pair of SiO(2)/Ta(2)O(5) dielectric DBR, and a three-lambda optical thickness InGaN/GaN active region. The current can be injected more effectively in the MCLED with a buried AlN current aperture. The output emission has a dominant emission peak wavelength at 440 nm with a very narrow linewidth of 0.52 nm, corresponding to a cavity Q-value of 846 at a driving current of 5 mA. (C) 2011 American Institute of Physics. [doi:10.1063/1.3617418]
High-Efficiency and Crack-Free InGaN-Based LEDs on a 6-inch Si (111) Substrate With a Composite Buffer Layer Structure and Quaternary Superlattices Electron-Blocking Layers
(2014-05-01)
Li, Zhen-Yu
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Lee, Chia-Yu
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Lin, Da-Wei
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Lin, Bing-Cheng
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Shen, Kun-Ching
In this paper, a composite buffer layer structure (CBLS) with multiple AlGaN layers and grading of Al composition/u-GaN1/(AlN/GaN) superlattices/u-GaN2 and InAlGaN/AlGaN quaternary superlattices electron-blocking layers (QSLs-EBLs) are introduced into the epitaxial growth of InGaN-based light-emitting diodes (LEDs) on 6-inch Si (111) substrates to suppress cracking and improve the crystalline quality and emission efficiency. The effect of CBLS and QSLs-EBL on the crystalline quality and emission efficiency of InGaN-based LEDs on Si substrates was studied in detail. Optical microscopic images revealed the absence of cracks and Ga melt-back etching. The atomic force microscopy images exhibited that the root-meansquare value of the surface morphology was only 0.82 nm. The full widths at half maxima of the (0002) and (1012) reflections in the double crystal X-ray rocking curve were similar to 330 and 450 arcs, respectively. The total threading dislocation density, revealed by transmission electron microscopy, was <6 x 10(8) cm(-2). From the material characterizations, described above, blue and white LEDs emitters were fabricated using the epiwafers of InGaNbased LEDs on 6-inch Si substrates. The blue LEDs emitter that comprised blue LEDs chip and clear lenses had an emission power of 490 mW at 350 mA, a wall-plug efficiency of 45% at 350 mA, and an efficiency droop of 80%. The white LEDs emitter that comprised blue LEDs chip and yellow phosphor had an emission efficiency of similar to 110 lm/W at 350 mA and an efficiency droop of 78%. These results imply that the use of a CBLS and QSLs-EBL was found to be very simple and effective in fabricating high-efficiency InGaN-based LEDs on Si for solid-state lighting applications.
Highly Efficient and Bright LEDs Overgrown on GaN Nanopillar Substrates
(2011-07-01)
Chiu, Ching-Hsueh
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Tu, Po-Min
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Lin, Chien-Chung
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Lin, Da-Wei
;
Li, Zhen-Yu
We presented a study of high-performance GaN-based light emitting diodes (LEDs) using a GaN nanopillars (NPs) structure grown on sapphire substrate by integrating RF-plasma molecular beam epitaxy (MBE) and metal-organic chemical vapor deposition (MOCVD). Nanoscale air voids were clearly observed at the interface between GaN NPs and the overgrown GaN layer by cross-sectional scanning electron microscopy. It can increase the light-extraction efficiency due to additional light scattering. The transmission electron microscopy images suggest the air voids between GaN NPs introduced during nanoscale epitaxial lateral overgrowth of GaN can suppress the threading dislocation density. Moreover, Raman spectrum demonstrated that the strain of the GaN layer grown on GaN NPs was effectively eliminated, resulting in the reduction of quantum-confined Stark effect in InGaN/GaN quantum wells. Consequently, the LEDs fabricated on the GaN NPs template exhibit smaller electroluminescent peak wavelength blue shift and great enhancement of the light output (70% at 20 mA) compared with the conventional LEDs.
Highly Efficient InGaN-Based Light Emitting Devices grown on Nanoscale Patterned Substrates by MOCVD
(2011)
Lin, Chien-Chung
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Chiu, Ching-Hsueh
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Huang, H. W.
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Chang, Shih-Pang
;
Kuo, Hao-Chung
Highly efficient InGaN-base light emitting diodes are crucial for next generation solid state lighting. However, drawbacks in substrate materials such as lattice and thermal expansion coefficient mismatches hold back the lamination efficiency improvement. In the past, patterned sapphire sustrate (PSS) has been proven to be effect to enhance the LED's performance. In this work, we reviewed several promising nano-scale technologies which successfully increase the output of LED through better material quality and light extraction. First, we presented a study of high-performance blue emission GaN LEDs using GaN nanopillars (NPs). It exhibits smaller blue shift in electroluminescent peak wavelength and great enhancement of the light output (70% at 20 mA) compared with the conventional LEDs. Secondly, GaN based LEDs with nano-hole patterned sapphire (NHPSS) by nano-imprint lithography are fabricated structure grown on sapphire substrate. At an injection current of 20mA, the LED with NHPSS increased the light output power of LEDs by 1.33 times, and the wall-plug efficiency is 30% higher at 20mA indicating that it had larger light extraction efficiency (LEE). Finally, we fabricated the high performance electrical pumping GaN-based semipolar {10-11} nano-pyramid LEDs on c-plane sapphire substrate by selective area epitaxy (SAE). The emission wavelength only blue-shifted about 5nm as we increased the forward current from 40 to 200mA, and the quantum confine stark effect (QCSE) had been remarkably suppressed on semipolar surface at long emission wavelength region. These results manifest the promising role of novel nanotechnology in the future III-nitride light emitters.
Highly Efficient InGaN-Based Light Emitting Devices grown on Nanoscale Patterned Substrates by MOCVD
(2012)
Lin, Chien-Chung
;
Chiu, Ching-Hsueh
;
Huang, H. W.
;
Chang, Shih-Pang
;
Kuo, Hao-Chung
Highly efficient InGaN-base light emitting diodes are crucial for next generation solid state lighting. However, drawbacks in substrate materials such as lattice and thermal expansion coefficient mismatches hold back the lamination efficiency improvement. In the past, patterned sapphire sustrate (PSS) has been proven to be effect to enhance the LED\'s performance. In this work, we reviewed several promising nano-scale technologies which successfully increase the output of LED through better material quality and light extraction. First, we presented a study of high-performance blue emission GaN LEDs using GaN nanopillars (NPs). It exhibits smaller blue shift in electroluminescent peak wavelength and great enhancement of the light output (70% at 20 mA) compared with the conventional LEDs. Secondly, GaN based LEDs with nano-hole patterned sapphire (NHPSS) by nano-imprint lithography are fabricated structure grown on sapphire substrate. At an injection current of 20mA, the LED with NHPSS increased the light output power of LEDs by 1.33 times, and the wall-plug efficiency is 30% higher at 20mA indicating that it had larger light extraction efficiency (LEE). Finally, we fabricated the high performance electrical pumping GaN-based semipolar {10-11} nano-pyramid LEDs on c-plane sapphire substrate by selective area epitaxy (SAE). The emission wavelength only blue-shifted about Snm as we increased the forward current from 40 to 200mA, and the quantum confine stark effect (QCSE) had been remarkably suppressed on semipolar surface at long emission wavelength region. These results manifest the promising role of novel nanotechnology in the future III-nitride light emitters.
Hole injection and electron overflow improvement in InGaN/GaN light-emitting diodes by a tapered AlGaN electron blocking layer
(2014-01-13)
Lin, Bing-Cheng
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Chen, Kuo-Ju
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Wang, Chao-Hsun
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Chiu, Ching-Hsueh
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Lan, Yu-Pin
A tapered AlGaN electron blocking layer with step-graded aluminum composition is analyzed in nitride-based blue light-emitting diode (LED) numerically and experimentally. The energy band diagrams, electrostatic fields, carrier concentration, electron current density profiles, and hole transmitting probability are investigated. The simulation results demonstrated that such tapered structure can effectively enhance the hole injection efficiency as well as the electron confinement. Consequently, the LED with a tapered EBL grown by metal-organic chemical vapor deposition exhibits reduced efficiency droop behavior of 29% as compared with 44% for original LED, which reflects the improvement in hole injection and electron overflow in our design. (C)2014 Optical Society of America
Improved Output Power of InGaN-Based Ultraviolet LEDs Using a Heavily Si-Doped GaN Insertion Layer Technique
(2012-02-01)
Chiu, Ching-Hsueh
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Lin, Chien-Chung
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Tu, Po-Min
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Huang, Shih-Cheng
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Tu, Chia-Cheng
In this paper, a high quality ultraviolet lightemitting diodes (UV-LEDs) at 375 nm was developed using a heavy Si-doping technique with metal organic chemical vapor deposition. By using high-resolution X-ray diffraction, the full width at half-maximum of the rocking curve shows that the GaN film inserting a heavily Si-doped GaN layer (Si-HDL) had high crystalline quality. From the transmission electron microscopy image, the threading dislocation density was decreased after inserting a Si-HDL between undoped and n-doped GaN layers by nanoscale epitaxial lateral overgrowth. As a result, a much smaller reverse current and a higher light output were achieved. The improvement of light output at an injection current of 20 mA was enhanced by 40%. Therefore, we can use an in-situ nano pattern without complex photolithography and etching process and improve the internal quantum efficiency of UV-LEDs.
Improvement in Crystalline Quality of InGaN-Based Epilayer on Sapphire via Nanoscaled Epitaxial Lateral Overgrowth
(2010)
Chiu, Ching-Hsueh
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Lin, Da-Wei
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Li, Zhen-Yu
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Chiu, Chin-Hua
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Chao, Chu-Li
In this study, a high-performance GaN-based light-emitting diode (LED) was achieved using a nanocolumn patterned sapphire substrate (NCPSS) with low-pressure metal-organic chemical vapor deposition (LP-MOCVD). The surface roughness was evaluated by atomic force microscopy (AFM). The mechanisms of carrier localization in the GaN-based LED fabricated on NCPSS were discussed referring to the results obtained from the power-dependent photoluminescence measurements. Moreover, from the transmission electron microscopy (TEM) image, the threading dislocation densities (TDDs) through the GaN-based LED fabricated on NCPSS were found to be about 10 times lower than those fabricated on planar substrates. Finally, the internal quantum efficiency (IQE) of the GaN-based LED fabricated on NCPSS was as high as 48% at 30 mW, corresponding to a current of 20 mA, which is higher than that of a GaN-based LED fabricated on a planar sapphire substrate by 8%. The use of NCPSS is suggested to be effective for elevating the emission efficiency of the GaN-based LED owing to an improvement in crystal quality. (C) 2010 The Japan Society of Applied Physics
Improvement in efficiency droop of GaN-based light-emitting diodes by optimization of active regions
(2012)
Lin, Da-Wei
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Wang, Chao-Hsun
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Chang, Shih-Pang
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Chiu, Ching-Hsueh
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Lan, Yu-Pin
In this paper, we propose several methods to improve the efficiency droop of GaN-based light-emitting diodes by optimization of active regions, such as alternative substrates, semi-polar MQWs, insertion layer, graded-thickness MQWs, and graded-composition EBL.