Browsing by Author "Chiu, HY"

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Computer-generated Chinese painting for landscapes and portraits
(2001)
Way, DL
;
Hsu, CW
;
Chiu, HY
;
Shih, ZC
;
資訊工程學系
Practiced for more than three thousand years, Chinese painting stresses the notion of "implicit meaning" in which painters use a minimum amount of strokes to express their deepest feelings. Chinese landscape and figure paintings are the two major themes of Chinese painting. Of relevant interest is more thoroughly understand Chinese art by analyzing basic rules of Chinese painting. This paper proposes two novel methods capable of synthesizing rock textures in Chinese landscape painting and synthesizing portraits in Chinese figure painting, respectively In addition to saving time during trial and error, these two methods attempt to synthesize painting styles. After users only specify the contour and parameters, our methods underwrite the complete painting process. With the requirement of familiarity with painting skills, individuals can paint various styles of Chinese painting.
Surface topography and alignment effects in UV-modified polyimide films with micron size patterns
(2003-04-01)
Pan, RP
;
Chiu, HY
;
Lin, YF
;
Huang, JY
;
電子物理學系
The characteristics of UV-modified polyimide CBDA-BAPP films for liquid crystal (LC) alignment have been investigated. Linearly polarized ultra-violet laser light (lambda = 325 nm) was used to expose the film. The LC direction of this film tends to be oriented parallel to the surface and perpendicular to the polarization direction of the laser light. The uniformity of the LC direction stabilizes when the exposure time exceeds a certain length. From the atomic force microscope investigation, we find that the films have been dented at the places exposed to the laser light. When a mask with striped pattern was used during exposure, we observed grooves in the exposed regions. The grooved patterns agree well with the calculated diffraction patterns caused by the mask, however, the groove direction has no effect on the alignment of the LCs. In our experiments, we also achieved LC alignment patterns as small as 2 mum using UV exposure with a mask.