Browsing by Author "Chou, KS"

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Effects of underlying films on the chemical-mechanical polishing for shallow trench isolation technology
(1997-10-31)
Wang, YL
;
Liu, C
;
Feng, MS
;
Dun, JW
;
Chou, KS
The effects of underlying films on the chemical-mechanical polishing (CMP) removal rate have been studied and characterized. A model for the underlying film mechanical properties such as hardness and Young's modulus, relating to the polishing removal rate was proposed. In addition, a modified shallow trench isolation (STI) process with a thin nitride overcoat has been suggested to eliminate the dishing and oxide remaining on nitride issues. Furthermore, in order to minimize the residual particles and metallic contamination, a modified multi-chemical spray-cleaning process provided for the post-STI CMP cleaning was also studied. (C) 1997 Elsevier Science S.A.