Browsing by Author "Chung, Yu Teng"

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The structural and electrical comparison of Y2O3 and Ti-doped Y2O3 dielectrics
(2017-02-15)
Lee, Ming Ling
;
Kao, Chyuan Haur
;
Chen, Hsiang
;
Lin, Chan Yu
;
Chung, Yu Teng
A Ti-doped Y2O3(Y2Ti2O5) dielectric on polycrystalline silicon followed by rapid thermal annealing results in improved characteristics including a higher effective dielectric constant, higher breakdown electric field, lower electron trapping rate, and larger charge-to-breakdown when compared with Y2O3. The performance of high-k Y2O3 and Y2Ti2O5 dielectrics were investigated using X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), capacitance-voltage, and current density-voltage. Incorporating Ti into the Y2O3 dielectric imparts improvements in the structural and electrical performance of the material. The Y2Ti2O5 dielectric with 800 degrees C annealing treatment has the best performance among all the samples tested.