Browsing by Author "Fang, J. S."

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CRYSTALLIZATION AND FAILURE BEHAVIORS OF Ta-Co NANOSTRUCTURED/AMORPHOUS DIFFUSION BARRIERS FOR COPPER METALLIZATION
(2003-12-01)
Fang, J. S.
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Chang, H. L.
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Chen, G. S.
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Lee, P. Y.
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材料科學與工程學系
This work examines the thin-film properties and diffusion barrier behaviors of thin Ta-Co films, aiming at depositing highly crystallization-resistant and highly conductive diffusion barriers for Cu metallization. Structure analyzing indicates that the deposited Ta-Co films indeed have a glassy structure and are free from highly resistive intermetallic compounds, thus giving a low resisitivity under 20 mu Omega-cm. Examining Si/Ta-Co/Cu stacked samples by using 4-point probes and XRD reveals that thermally induced failure of amorphous Ta-Co barriers are triggered by the barrier\'s crystallization at temperatures just under around 600 degrees C. The effectiveness of the nanostructure/amorphous Ta-Co thin film thus can be substantially enhanced by effectively blocking diffusion of copper towards the underlying silicon.
Optical Properties of AlxOy/Ni/AlxOy Multilayered Absorber Coatings Prepared by Reactive DC Magnetron Sputtering
(2014-01-01)
Tsai, T. K.
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Hsueh, S. J.
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Fang, J. S.
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材料科學與工程學系
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Department of Materials Science and Engineering
Al (x) O (y) /Ni/Al (x) O (y) multilayered absorber coatings were deposited on stainless-steel substrates using reactive direct-current (DC) magnetron sputtering. Al (x) O (y) films with different morphologies, structures, and optical transmittances were obtained by varying the DC power and oxygen flux. The Al (x) O (y) films were characterized using field-emission scanning electron microscopy, transmission electron microscopy, energy-dispersive x-ray spectrometry, grazing-incidence x-ray diffraction, and ultraviolet/visible/near-infrared spectrophotometry. The effect of the thickness of the Al (x) O (y) films on the optical properties of Al (x) O (y) /Ni/Al (x) O (y) coatings was also investigated. Experimental results show that the thermal emittance of the Al (x) O (y) /Ni/Al (x) O (y) multilayered absorber coatings decreases as the thickness of the Al (x) O (y) top layer is decreased. The Al (x) O (y) /Ni/Al (x) O (y) multilayered absorber coating with 70-nm-thick Al (x) O (y) top and bottom layers showed the best optical properties. The thermal stability of the Al (x) O (y) /Ni/Al (x) O (y) multilayered absorber coating in which the Al (x) O (y) films were deposited at conditions of 150 W and 8 sccm O-2 was at least 12 h when the multilayered absorber was annealed at 400A degrees C in air.