Browsing by Author "Gawronski, Heiko"

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Hard repulsive barrier in hot adatom motion during dissociative adsorption of oxygen on Ag(100)
(2009-11-07)
Hsieh, Ming-Feng
;
Lin, Deng-Sung
;
Gawronski, Heiko
;
Morgenstern, Karina
;
物理研究所
Random pairing simulation and low temperature scanning tunneling microscopy (STM) are used to investigate the detailed O(2) dissociative adsorption processes at 200 K for various coverages. The distribution of oxygen adatoms shows a strong repulsion between the adsorbates with a radius of similar to 0.8 nm. The comparison between STM results and simulation reveals two prominent pairing distances of 2 and 4 nm and their branching ratio is about 2:1. These findings shed new light on the origin of the large intrapair distances found and on the process behind the empirical "eight-site rule.".