Browsing by Author "Gismatulin, A. A."

Now showing 1 - 5 of 5

Charge transport mechanism in SiNx-based memristor
(2019-12-16)
Gismatulin, A. A.
;
Gritsenko, V. A.
;
Yen, T-J
;
Chin, A.
;
電子工程學系及電子研究所
Amorphous silicon nitride is a key dielectric in silicon devices. The advantage of SiNx and Si3N4 over other dielectrics is that silicon nitride is compatible with silicon technology and is widely used in it. It is necessary to understand, experimentally and theoretically, the mechanism of charge transport in a memristor based on silicon nitride in the initial, high-resistance, and low-resistance states to develop a resistive memory element. At present, there is currently no single universal model of charge transport in a memristor based on silicon nitride. In our work, the charge transport of the initial, high, and low resistive states in an SiNx-based memristor is analyzed with four bulk-limited charge transport models. It is established that the Frenkel model of Coulomb traps ionization, Hill-Adachi model of overlapping Coulomb traps, and Makram-Ebeid and Lannoo model of multiphonon isolated traps ionization, quantitatively, do not describe the charge transport of the SiNx-based memristor in any state. The Nasyrov-Gritsenko model of phonon-assisted tunneling between traps gives a consistent explanation of the charge transport of the SiNx-based memristor in all states at temperatures above room temperature.
Charge transport mechanism of high-resistive state in RRAM based on SiOx
(2019-01-21)
Gismatulin, A. A.
;
Kruchinin, V. N.
;
Gritsenko, V. A.
;
Prosvirin, I. P.
;
Yen, T. -J.
Nonstoichiometric silicon oxide SiOx is a promising material for developing a new generation of high-speed, reliable flash memory based on the resistive effect. It is necessary to understand the electron transport mechanism of the high-resistive state in SiOx to develop a resistive memory element. At present, it is generally accepted that the charge transport of the high-resistive state in the Resistive Random Access Memory (RRAM) is described by the Frenkel effect. In our work, the charge transport of the high-resistive state in RRAM based on SiOx is analyzed with two contact-limited and five volume-limited charge transport models. It is established that the Schottky effect model, thermally assisted tunneling, the Frenkel model of Coulomb trap ionization, the Makram-Ebeid and Lannoo model of multiphonon isolated trap ionization, and the Nasyrov-Gritsenko model of phonon-assisted tunneling between traps, quantitatively, do not describe the charge transport of the high-resistive state in the RRAM based on SiOx. The Shklovskii-Efros percolation model gives a consistent explanation for the charge transport of the highresistive state in the RRAM based on SiOx at temperatures above room temperature. Published under license by AIP Publishing.
Mechanism of stress induced leakage current in Si3N4
(2019-07-01)
Gritsenko, V. A.
;
Gismatulin, A. A.
;
Baraban, A. P.
;
Chin, A.
;
交大名義發表
In this paper, the experimental current density versus electric field characteristics of Si3N4 before and after the electrical field-induced stress were measured. It is shown that, the Frenkel model of Coulomb trap ionization, Hill-Adachi model of overlapping Coulomb traps, Makram-Ebeid and Lannoo multiphonon isolated trap ionization model do not describe the charge transport of Si3N4 before and after the electrical field-induced stress. The Nasyrov-Gritsenko model of phonon assisted tunneling between traps quantitatively describes the hole transport mechanism in Si3N4 before and after the induced stress at traps energies W-t = 1.6 eV and W-opt = 3.2 eV. The current leakage at different induced stresses in Si3N4 is explained by the increase of trap concentration via the creation of Si-Si bonds, which are traps in Si3N4.
Memristor effect in GeO[SiO2] and GeO[SiO] solid alloys films
(2019-06-10)
Volodin, V. A.
;
Kamaev, G. N.
;
Gritsenko, V. A.
;
Gismatulin, A. A.
;
Chin, A.
The p-Si(or n-Si)/GeO[SiO2] (or GeO[SiO])/indium-tin-oxide (ITO) structures were fabricated by simultaneous evaporation of GeO2 and SiO2 (or SiO) powders in high vacuum and further deposition of ITO contacts using the magnetron sputtering technique. The structural properties of the GeO[SiO2] and GeO[SiO] films were studied using FTIR and Raman spectroscopy. According to Raman data, the GeO[SiO] films deposited at a temperature of 100 degrees C contain amorphous Ge clusters. Their current-voltage characteristics were measured in the air atmosphere, and resistive switching (memristor effect) was observed in structures without a preliminary forming procedure. The Shklovskii-Efros percolation model gives a consistent explanation for the charge transport in the high-resistive state and the low-resistive state of memristors based on GeO[SiO2] or GeO[SiO] films.
Multiphonon trap ionization transport in nonstoichiometric SiNx
(2019-03-01)
Gritsenko, V. A.
;
Gismatulin, A. A.
;
Chin, A.
;
交大名義發表
;
National Chiao Tung University
It is generally accepted that the charge transport in dielectrics is governed by coulombic trap ionization due to a barrier lowering in high electric fields (Frenkel effect). In this paper, the charge transport mechanism in Si3N4 and nonstoichiometric silicon rich SiNx is experimentally studied and quantitatively analyzed with five theoretical models: Frenkel model of Coulomb traps ionization, Hill-Adachi model of overlapping Coulomb traps, Shklovskii-Efros percolation model, Makram-Ebeid and Lannoo model of multiphonon isolated traps ionization and Nasyrov-Gritsenko model of phonon-assisted electron tunneling between nearby traps. It is shown that the charge transport in Si3N4 and SiNx is qualitatively described by Frenkel effect, but Frenkel effect predicts an enormously low attempt to escape factor value. The charge transport at traps energies W-t = 1.6 eV and W-opt = 3.2 eV in Si3N4 and SiNx can be described by an increase in traps concentration in the framework of Makram-Ebeid and Lannoo model and Nasyrov-Gritsenko model. The Makram-Ebeid and Lannoo model quantitatively describes the charge transport in Si3N4 and SiNx with low silicon enrichment. The charge transport in nonstoichiometric SiNx with high silicon enrichment is well explained by Nasyrov-Gritsenko model.