Browsing by Author "HONG, TY"

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FABRICATION OF MOSFETS USING LOW-TEMPERATURE LIQUID-PHASE DEPOSITED OXIDE
(1995-06-01)
YEH, CF
;
LIN, SS
;
HONG, TY
;
交大名義發表
;
電子工程學系及電子研究所
Low-temperature, high quality liquid-phase deposition (LPD) oxide was developed. The MOSFETs with such a new LPD oxide as gate insulators were investigated. The electrical characteristics, including threshold voltage of 2.1 Volts, peak effective mobility (mu(FE)) Of 580 cm(2)/V . s, and subthreshold swing of 134 mV/decade, show the devices exhibit comparable performance to other low-temperature processed MOSFETs. This demonstrates that LPD oxide can be an suitable candidate for future gate insulators in low-temperature processed MOSFETs.
LOW-TEMPERATURE PROCESSED MOSFETS WITH LIQUID-PHASE DEPOSITED SIO2-XFX AS GATE INSULATOR
(1995-07-01)
YEH, CF
;
LIN, SS
;
HONG, TY
;
電子工程學系及電子研究所
;
Department of Electronics Engineering and Institute of Electronics
Device performances of MOSFET's with SiO2-xFx gate oxides prepared by an extremely low-temperature (15 degrees C) liquid phase deposition (LPD) method were investigated. The electrical characteristics, including threshold voltage of 2.1 V, peak effective mobility (mu(eff)) of 525 cm(2)V . s, and subthreshold suing of 134 mV/decade, show the devices exhibit comparable performance to other low-temperature processed MOSFET's. This demonstrates that LPD SiO2-xFx can be a suitable candidate for future gate insulators in low-temperature processed MOSFET's.
LOW-TEMPERATURE-PROCESSED POLY-SI THIN-FILM TRANSISTORS USING SOLID-PHASE-CRYSTALLIZED AND LIQUID-PHASE-DEPOSITED GATE OXIDE
(1994-04-01)
YEH, CF
;
CHEN, CL
;
YANG, YC
;
LIN, SS
;
YANG, TZ
Poly-Si thin-film transistor (TFT) devices using solid-phase-crystallized and liquid-phase-deposited gate oxide are, for the first time, realized by low-temperature processes (LTP) (<625-degrees-C) for future LCDs and 3-D integrated circuits. The method of liquid-phase deposition of SiO2 (LPD-SiO2) is described. The physical, chemical and electrical properties of the new dielectric layer are clarified. The TFT (W/L = 200 mum/10 mum) having an on-off current ratio of 10(6) at V(D) = 5 V, a field-effect mobility of 15 cm2/V.s at V(D) = 0.1 V, a threshold voltage of 5.6 V, and a subthreshold swing of 1.6 V/decade, exhibits sufficient performance for pixel transistors. The field-effect mobility is strongly dependent on channel length. Effective passivation of defects by plasma hydrogenation will be very essential to achieve higher performance.