Browsing by Author "Hsu, Chih Wei"

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Carrier transportation mechanism of the TaN/HfO(2)/IL/Si structure with silicon surface fluorine implantation
(2008-07-01)
Wu, Woei Cherng
;
Lai, Chao-Sung
;
Wang, Tzu-Ming
;
Wang, Jer-Chyi
;
Hsu, Chih Wei
In this paper, the current transportation mechanism of HfO(2) gate dielectrics with a TaN metal gate and silicon surface fluorine implantation is investigated. Based on the experimental results of the temperature dependence of gate leakage current and Fowler-Nordheim tunneling characteristics at 77 K, we have extracted the current transport mechanisms and energy band diagrams for TaN/HfO(2)/IL/Si structures with fluorine incorporation, respectively. In particular, we have obtained the following physical quantities: 1) fluorinated and as-deposited interfacial layer (IL)/Si barrier heights (or conduction band offsets) at 3.2 and 2.7 eV; 2) TaN/fluorinated and as-deposited HfO(2) barrier heights at 2.6 and 1.9 eV; and 3) effective trapping levels at 1.25 eV (under both gate and substrate injections) below the HIM conduction band and at 1.04 eV (under gate injection) and 1.11 eV (under substrate injection) below the HfO(2) conduction band, which contributes to Frenkel-Poole conduction.
Current transport mechanism for HfO2 gate dielectrics with fluorine incorporation
(2008)
Wu, Woei Cherng
;
Lai, Chao Sung
;
Wang, Tzu Ming
;
Wang, Jer Chyi
;
Hsu, Chih Wei
In this article, the current transport mechanism of fluorinated HfO2 gate dielectrics is investigated. Based on the experimental results of the temperature dependence of gate leakage current and Fowler-Nordheim tunneling characteristics at 77 K, we have extracted the energy band diagrams and current transport mechanisms for TaN/HfOF/fluorinated-interfacial layer (IL)/Si structures. In particular, we have obtained the following quantities that will be useful for modeling and simulation: (i) fluorinated IL/Si barrier height (or conduction band offset): 3.2 eV; (ii) TaN/HfOF barrier height: 2.6 eV; and (iii) trap levels at 1.3 eV (under both gate and substrate injections) below the HfOF conduction band which contributes to Frenkel-Poole conduction. (C) 2007 The Electrochemical Society.