Browsing by Author "Huang, H. M."

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Characteristics of a-plane GaN with the SiN(x) insertion layer grown by metal-organic chemical vapor deposition
(2008-11-15)
Ko, T. S.
;
Wang, T. C.
;
Huang, H. M.
;
Chen, J. R.
;
Chen, H. G.
We utilized in-situ-grown SiN(x) insertion layers to mitigate part of dislocations stretching in nonpolar a-plane GaN films using metal-organic chemical vapor deposition. Both X-ray diffraction (XRD) and atomic force microscopy (AFM) measurements revealed that better crystal quality and smoother surface could be obtained when the in-situ SiN(x) layer was inserted closer to the r-plane sapphire substrate and indicated that the in-situ SiN(x) insertion layer could suppress dislocations caused by lattice mismatch between the sapphire and epitaxial layers. In addition, photoluminescence and cathodoluminescence measurements confirmed the effect of the in-situ SiN(x) insertion layer on the optical properties of the improved a-plane GaN thin film, which is consistent with the XRD and AFM analyses and suggested reduction in the density of nonradiative centers. (C) 2008 Elsevier B.V. All rights reserved.
Characteristics of a-plane GaN with the SiNx insertion layer grown by metal-organic chemical vapor deposition
(2008-11-15)
Ko, T. S.
;
Wang, T. C.
;
Huang, H. M.
;
Chen, J. R.
;
Chen, H. G.
We utilized in-situ-grown SiNx insertion layers to mitigate part of dislocations stretching in nonpolar a-plane GaN films using metal-organic chemical vapor deposition. Both X-ray diffraction (XRD) and atomic force microscopy (AFM) measurements revealed that better crystal quality and smoother surface could be obtained when the in-situ SiNx layer was inserted closer to the r-plane sapphire substrate and indicated that the in-situ SiNx insertion layer could suppress dislocations caused by lattice mismatch between the sapphire and epitaxial layers. In addition, photoluminescence and cathodoluminescence measurements confirmed the effect of the in-situ SiNx insertion layer on the optical properties of the improved a-plane GaN thin film, which is consistent with the XRD and AFM analyses and suggested reduction in the density of nonradiative centers. (C) 2008 Elsevier B.V. All rights reserved.
Characteristics of emission polarization in a-plane nanorods embedded with InGaN/GaN multiple quantum wells
(2010-09-15)
Li, J. C.
;
Lu, T. C.
;
Huang, H. M.
;
Chan, W. W.
;
Kuo, H. C.
Nonpolar (a-plane) GaN nanorod arrays with embedded In(x)Ga(1-x)N/GaN (x=0.09, 0.14, 0.24, and 0.30) multiple quantum wells (MQWs) grown on r-plane sapphire have been fabricated successfully by self-assembled Ni nanomasks and subsequent inductively coupled plasma reactive-ion etching. After nanorod fabrications, the polarization ratio of the emission from MQWs with lower indium composition (x=0.09 and 0.14) slightly decreases but apparently increases by at most 79% for the samples with higher indium composition (x=0.24 and 0.30). Competition between the effect of multiple scattering, strain relaxation and reduction in localized centers, expected in a-plane MQW samples, are attributed to the variations in the polarization ratios after the nanorod formation. (c) 2010 American Institute of Physics. [doi:10.1063/1.3483239]
Characteristics of emission polarization in a-plane nanorods embedded with InGaN/GaN multiple quantum wells
(2010-09-15)
Li, J. C.
;
Lu, T. C.
;
Huang, H. M.
;
Chan, W. W.
;
Kuo, H. C.
Nonpolar (a-plane) GaN nanorod arrays with embedded In(x)Ga(1-x)N/GaN (x=0.09, 0.14, 0.24, and 0.30) multiple quantum wells (MQWs) grown on r-plane sapphire have been fabricated successfully by self-assembled Ni nanomasks and subsequent inductively coupled plasma reactive-ion etching. After nanorod fabrications, the polarization ratio of the emission from MQWs with lower indium composition (x=0.09 and 0.14) slightly decreases but apparently increases by at most 79% for the samples with higher indium composition (x=0.24 and 0.30). Competition between the effect of multiple scattering, strain relaxation and reduction in localized centers, expected in a-plane MQW samples, are attributed to the variations in the polarization ratios after the nanorod formation. (c) 2010 American Institute of Physics. [doi:10.1063/1.3483239]
Growth and characterization of a-plane Al(x)Ga(1-x)N alloys by metalorganic chemical vapor deposition
(2010-03-01)
Huang, H. M.
;
Ling, S. C.
;
Chen, J. R.
;
Ko, T. S.
;
Li, J. C.
The non-polar a-plane Al(x)Ga(1-x)N alloys on GaN epitaxial layer with different Al compositions (0 <= x <= 0.2) were grown on r-plane (1 (1) over bar 0 2) sapphire substrates by using low-pressure metalorganic chemical vapor deposition (MOCVD) and the Al composition x were estimated from the X-ray diffraction measurements. According to the result of asymmetric X-ray reciprocal space mapping, AlGaN layer was coherently strained to the underlying GaN template. The a-plane AlGaN alloy with relatively lower Al composition showed a flat surface with reduction of pits. The best mean roughness of the surface morphology was 1.18 nm. The photoluminescence (PL) result revealed that the PL peak position shifted from 3.42 to 3.87 eV with 0 <= x <= 0.2. Apart from the shifted peak position with increasing Al content, the PL emission intensity and surface morphology of the a-plane AlGaN alloy with relatively low Al content show slightly better characteristics than that of the a-plane GaN and AlGaN with higher Al composition. (C) 2010 Elsevier B.V. All rights reserved.
Growth and characterization of a-plane AlxGa1-xN alloys by metalorganic chemical vapor deposition
(2010-03-01)
Huang, H. M.
;
Ling, S. C.
;
Chen, J. R.
;
Ko, T. S.
;
Li, J. C.
The non-polar a-plane AlxGa1-xN alloys on GaN epitaxial layer with different Al compositions (0 <= x <= 0.2) were grown on r-plane (1 (1) over bar 0 2) sapphire substrates by using low-pressure metalorganic chemical vapor deposition (MOCVD) and the Al composition x were estimated from the X-ray diffraction measurements. According to the result of asymmetric X-ray reciprocal space mapping, AlGaN layer was coherently strained to the underlying GaN template. The a-plane AlGaN alloy with relatively lower Al composition showed a flat surface with reduction of pits. The best mean roughness of the surface morphology was 1.18 nm. The photoluminescence (PL) result revealed that the PL peak position shifted from 3.42 to 3.87 eV with 0 <= x <= 0.2. Apart from the shifted peak position with increasing Al content, the PL emission intensity and surface morphology of the a-plane AlGaN alloy with relatively low Al content show slightly better characteristics than that of the a-plane GaN and AlGaN with higher Al composition. (C) 2010 Elsevier B.V. All rights reserved.