Browsing by Author "Huang, Huan-Shun"

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A 0.325 V, 600-kHz, 40-nm 72-kb 9T Subthreshold SRAM with Aligned Boosted Write Wordline and Negative Write Bitline Write-Assist
(2015-05-01)
Lu, Chien-Yu
;
Chuang, Ching-Te
;
Jou, Shyh-Jye
;
Tu, Ming-Hsien
;
Wu, Ya-Ping
This brief presents a two-port disturb-free 9T subthreshold static random access memory (SRAM) cell with independent single-ended read bitline and write bitline (WBL) and cross-point data-aware write structure to facilitate robust subthreshold operation and bit-interleaving architecture for enhanced soft error immunity. The design employs a variation-tolerant line-up write-assist scheme where the timing of area-efficient boosted write wordline and negative WBL are aligned and triggered/initiated by the same low-going global WBL to maximize the write-ability enhancement. A 72-kb test chip is implemented in United Microelectronics Corp. 40-nm low-power (40LP) CMOS. Full functionality is achieved for V-DD ranging from 1.5 to 0.32 V without redundancy. The measured maximum operation frequency is 260 MHz (450 kHz) at 1.1 V (0.32 V) and 25 degrees C. At 0.325 V and 25 degrees C, the chip operates at 600 kHz with 5.78 mu W total power and 4.69 mu W leakage power, offering 2x frequency improvement compared with 300 kHz of our previous 72-kb 9T subthreshold SRAM design in the same 40LP technology. The energy efficiency (power/frequency/IO) at 0.325 V and 25 degrees C is 0.267 pJ/bit, a 23.7% improvement over the 0.350 pJ/bit of our previous design.
A 0.33-V, 500-kHz, 3.94-mu W 40-nm 72-Kb 9T Subthreshold SRAM With Ripple Bit-Line Structure and Negative Bit-Line Write-Assist
(2012-12-01)
Lu, Chien-Yu
;
Tu, Ming-Hsien
;
Yang, Hao-I
;
Wu, Ya-Ping
;
Huang, Huan-Shun
This paper presents an ultra-low-power 72-Kb 9T static random-access memory (SRAM) with a ripple bit-line (RPBL) structure and negative bit-line (NBL) write-assist. The RPBL scheme provides over 40% read access performance improvement for VDD below 0.4 V compared with the conventional hierarchical bit-line structure. A variation-tolerant ripple-initiated NBL write-assist scheme with the transient negative pulse coupled only into the single selected local bit-line segment is employed to enhance the NBL, boosting efficiency and reducing power consumption. The 331 x 385 mu m(2) 72-Kb SRAM macro has been fabricated in UMC 40-nm low-power CMOS technology and was tested with full suites of SRAM compiler qualification patterns. Error-free full functionality without redundancy is achieved from 1.5 V down to 0.33 V. The measured maximum operation frequency is 220 MHz (500 kHz) at 1.1 V (0.33 V) and 25 degrees C. The measured total power consumption is 3.94 mu W at 0.33 V, 500 kHz, and 25 degrees C.
A 0.35 V, 375 kHz, 5.43 mu W, 40 nm, 128 kb, symmetrical 10T subthreshold SRAM with tri-state bit-line
(2016-05)
Wu, Shang-Lin
;
Lu, Chien-Yu
;
Tu, Ming-Hsien
;
Huang, Huan-Shun
;
Lee, Kuen-Di
This paper presents a disturb-free 10T subthreshold SRAM cell with fully-symmetrical structure and tristate pre-charge free bit-line (BL). The disturb-free feature facilitates bit-interleaving architecture that can reduce multiple-bit errors in a single word and enhance soft error immunity by employing error checking and correction (ECC) techniques. The fully-symmetrical cell structure provides balanced margin and performance in advanced strained-silicon and/or FinFET technologies where PMOS strength approaches that of NMOS. The tri-state BL is left floating in standby state to minimize switching activity for energy efficiency. The scheme eliminates the need of BL keeper, provides balanced two-transistor stack read for better read performance, and eases the design and migration. The proposed 10T SRAM cell is demonstrated by 128 kb SRAM macro implemented in 40 nm low-power (40LP) CMOS technology. Measured read and write functionality is demonstrated with V-DD down to 0.35 V (similar to 100 mV lower than the threshold voltage). Data is held down to 0.325 V with 2.53 mu W standby power. The measured maximum operation frequency is 375 kHz with total power consumption 5.43 mu W at 0.35 V. (C) 2016 Elsevier Ltd. All rights reserved.
A 0.5-V 28-nm 256-kb Mini-Array Based 6T SRAM With Vtrip-Tracking Write-Assist
(2017-07-01)
Wu, Shang-Lin
;
Li, Kuang-Yu
;
Huang, Po-Tsang
;
Hwang, Wei
;
Tu, Ming-Hsien
This paper presents a 28-nm 256-kb 6T static random access memory operating down to near-threshold regime. The cell array is built on foundry 4-by-2 mini-array with split single-ended large signal sensing to enable an ultra-short local bit-line of 4-b length to improve variation tolerance and performance, and to reduce disturb while maintaining manufacturability. The design employs threshold power gating to facilitate lower NAP (Sleep) mode voltage/power and faster wake-up for the cell array, and low-swing global read bit-line (GRBL) with integrated low-swing voltage precharger to improve read performance and reduce the dynamic read power. A cell Vtrip-tracking write-assist (VTWA) lowers the selected sub-array supply to cell inverter trip voltage to enhance write-ability while providing PVT tracking capability to ensure adequate data retention margin for unselected cells in the selected sub-array. The 256-kb test chip is implemented in UMC 28-nm high-kappa metal-gate (H kappa MG) CMOS technology with macro area of 1058.22 x 374.76 mu m(2). Error-free full functionality is achieved from 0.9 down to 0.5 V (limited by read VMIN) without redundancy. The low-swing GRBL reduces dynamic power by 6.5% (8.0%) at 0.9 V (0.6 V). The VTWA improves the write VMIN by 75 mV (from 0.525 to 0.45 V). The measured maximum operation frequency is 735 MHz (20 MHz) at 0.9 V (0.5 V), TT corner, 25(omicron).
A 40nm 1.0Mb 6T Pipeline SRAM with Digital-Based Bit-Line Under-Drive, Three-Step-Up Word-Line, Adaptive Data-Aware Write-Assist with VCS Tracking and Adaptive Voltage Detector for Boosting Control
(2013-01-01)
Liao, Wei-Nan
;
Lien, Nan-Chun
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Chang, Chi-Shin
;
Chu, Li-Wei
;
Yang, Hao-I
This paper presents a 40nm 1.0Mb pipeline 6T SRAM featuring digital-based Bit-Line Under-Drive (BLUD) with large-signal sensing and Three-Step-Up Word-Line (TSUWL) to improve RSNM, Read performance and Write-ability. An Adaptive DataAware Write-Assist (ADAWA) with VCS tracking is employed to further improve Write-ability while ensuring adequate stability for half-selected cells on the selected bit-lines. An Adaptive Voltage Detector (AVD) with binary boosting control is used to mitigate gate dielectric over-stress. The 1.0Mb test chip operates from 1.5V to 0.7V, with operating frequency of 1.07GHz@1.2V and 887MHz@1.1V at 25 degrees C. The measured power consumption is 43.47mW (Active)/3.91mW (Leakage) at 1.1V and 8.97mW (Active)/0.52mW (Leakage) at 0.7V, TT, 25 degrees C.
A 40nm 1.0Mb Pipeline 6T SRAM with Variation-Tolerant Step-Up Word-Line and Adaptive Data-Aware Write-Assist
(2013)
Chang, Chi-Shin
;
Yang, Hao-I
;
Liao, Wei-Nan
;
Lin, Yi-Wei
;
Lien, Nan-Chun
We present a 1.0Mb pipeline 6T SRAM in 40nm Low-Power CMOS technology. The design employs a variation-tolerant Step-Up Word-Line (SUWL) to improve the Read Static Noise Margin (RSNM) without compromising the Read performance and Write-ability. The Write-ability is further enhanced by an Adaptive Data-Aware Write-Assist (ADAWA) scheme. The 1.0Mb test chip operates from 1.5V to 0.7V, with operating frequency of 800MHz@1.2V and 25 degrees C. The measured power consumption is 23.21mW (Active)/2.42mW (Leakage) at 1.2V, TT, 25 degrees C; and 6.01mW (Active)/0.35mW (Leakage) at 0.7V, TT, 25 degrees C.
A Single-Ended Disturb-Free 9T Subthreshold SRAM With Cross-Point Data-Aware Write Word-Line Structure, Negative Bit-Line, and Adaptive Read Operation Timing Tracing
(2012-06-01)
Tu, Ming-Hsien
;
Lin, Jihi-Yu
;
Tsai, Ming-Chien
;
Lu, Chien-Yu
;
Lin, Yuh-Jiun
This paper presents a novel single-ended disturb-free 9T subthreshold SRAM cell with cross-point data-aware Write word-line structure. The disturb-free feature facilitates bit-inter-leaving architecture, which can reduce multiple-bit upsets in a single word and enhance soft error immunity by employing Error Checking and Correction (ECC) technique. The proposed 9T SRAM cell is demonstrated by a 72 Kb SRAM macro with a Negative Bit-Line (NBL) Write-assist and an adaptive Read operation timing tracing circuit implemented in 65 nm low-leakage CMOS technology. Measured full Read and Write functionality is error free with V-DD down to 0.35 V (similar to 0.15 V lower than the threshold voltage) with 229 KHz frequency and 4.05 mu W power. Data is held down to 0.275 V with 2.29 mu W Standby power. The minimum energy per operation is 4.5 pJ at 0.5 V. The 72 Kb SRAM macro has wide operation range from 1.2 V down to 0.35 V, with operating frequency of around 200 MHz for V-DD around/above 1.0 V.