Browsing by Author "Huang, W. L."

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A program-erasable high-k Hf0.3N0.2O0.5 MIS capacitor with good retention
(2007-10-01)
Yang, H. J.
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Chin, Albert
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Chen, W. J.
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Cheng, C. F.
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Huang, W. L.
We describe a programmable-erasable MIS capacitor with a single high-kappa Hf0.3N0.2O0.5 dielectric layer. This device showed a capacitance density of similar to 6.6 fF/mu m(2), low program and erase voltages of +5 and -5 V, respectively, and a large Delta V-fb memory window of 1.5 V. In addition, the 25 degrees C data retention was good, as indicated by program and erase decay rates of only 2 and 6.2 mV/dec, respectively. Such device retention is attributed to the deep trapping level of 1.05 eV in the Hf0.3N0.2O0.5.
Determination of the microstructure of Eu-treated ZnO nanowires by x-ray absorption
(2010-02-08)
Huang, W. L.
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Labis, J.
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Ray, S. C.
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Liang, Y. R.
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Pao, C. W.
X-ray absorption near-edge structure (XANES), extended x-ray absorption fine structures (EXAFS), and photoluminescence measurements were used to elucidate the microstructural and photoluminescence properties of ZnO nanowires (ZnO-NWs) that had been treated with Eu by thermal diffusion. The O K- and Eu L(3)-edge XANES and EXAFS spectra at the Zn K- and Eu L(3)-edge verified the formation of Eu(2)O(3)-like layer on the surface of ZnO-NWs. X-ray diffraction, XANES and EXAFS measurements consistently suggest the lack of substitutional doping of Eu ions at the Zn ion sites in the interior of ZnO-NWs. The clear sharp and intense emission bands in the range 610-630 nm of Eu-treated ZnO-NWs originated from the intra-4f transition of Eu ions in the Eu(2)O(3)-like surface layer.