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Browsing by Author "Jan, YK"

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    Control system design for a rapid thermal processing system
    (2001-01-01)
    Lin, CA
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    Jan, YK
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    電控工程研究所
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    Institute of Electrical and Control Engineering
    This paper proposes a control system design for a rapid thermal processing (RTP) system, which has four circular concentric lamp zones and four temperature sensors. The control system consists of a least square feedforward controller and an output feedback proportional plus integral (PI) controller. The goal is to maintain uniform temperature tracking for typical ramp-up and hold-steady profiles. A high-order nonlinear model describing the temperature dynamics of the rapid thermal processing (RTP) system is used for the feedforward controller design. A balanced reduced model, obtained from a linear model around a desired uniform steady-state temperature, is used for the design of the multiinput-multioutput (MIMO) PI controller. The PI controller gain matrices are designed using an LQR-based procedure. Tradeoff between robustness and performance of the system is discussed, Simulation results show the control system designed yields robust temperature tracking with good uniformity for a wide temperature range.
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    Lamp configuration design for rapid thermal processing systems
    (1998-02-01)
    Jan, YK
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    Lin, CA
    ;
    電控工程研究所
    ;
    Institute of Electrical and Control Engineering
    We study lamp configuration design for rapid thermal processing (RTP) systems, We consider a configuration consists of four concentric circular lamp zones, three of them above the wafer and one circumvallating the wafer, We propose a method to determine the geometric parameters, the width, height and radius, of the lamp zones so that the configuration designed has the capacity to achieve uniform temperature on the wafer, The method is based on a necessary and sufficient condition for uniform temperature tracking and analytic expressions of the view factors, A design example is given in which a least square open-loop control law yields good temperature uniformity.