Browsing by Author "Kang, Che-Hao"

Now showing 1 - 3 of 3

A COMBINED PROCESS OF SILICON SHADOW MASKING AND INKJET PRINTING (SSMP) FOR MAKING GRAPHENE OXIDE AND REDUCED GRAPHENE OXIDE MICROSTRUCTURES FOR SELECTIVE CELL CULTURING APPLICATIONS
(2019-01-01)
Kang, Che-Hao
;
Fu, Yu-Min
;
Kao, Chin-Chuan
;
Yang, Jia-Wei
;
Tseng, Ming-Liang
This paper demonstrates a combined process of silicon shadow masking and inkjet printing (SSMP) to fabricate graphene oxide (GO) and reduced graphene oxide (rGO) line features with a width ranging from 20 to 70 mu m on varieties of substrates, such as PDMS, SiO2 , Kapton, etc. for selectively cell (RPE and PC-12 cells) culturing applications. The rGO with an electrical resistance of 33.48k Omega/ is characterized via a printed four point resistivity measurement structure. Owing to the characteristics of low chemical usage, low process temperature and complexity, and high fault tolerance of inkjet printers, the process technique has shown its potential for biomedical applications in terms of flexible cell culturing platform fabrication.
An Inkjet Printing Technique for Scalable Microfabrication of Graphene-Based Sensor Components
(2020-01-01)
Fu, Yu-Min
;
Chou, Meng-Chuin
;
Kang, Che-Hao
;
Cheng, Yu-Ting
;
Wu, Pu-Wei
This paper presents a versatile and precise graphene patterning technique using the combined process of masking and inkjet printing. A graphene-based structure is fabricated by first defining the structural pattern and position using a masking mold, which can be either electroplated copper or deep reactive ion etching (DRIE) silicon shadow mask, followed by inkjet deposition of graphene ink and lift-off. The hybrid technique can realize high-fidelity, high-resolution graphene-based microstructures including free-standing and cantilever beams, four-point resistive measurement structures, and piezoresistive sensing elements with a minimum line width of similar to 20 mu m. Moreover, this method can facilitate the micropatterning of graphene oxide (GO) and reduced graphene oxide (rGO) on substrates such as polydimethylsiloxane (PDMS) and SiO2/Si for selective cell culturing applications. Owing to the characteristics of low chemical usage, low process temperature and complexity, and high fiexibility and fault tolerance of inkjet printing, this technique demonstrates compelling potential for a variety of biomedical applications.
Printable Graphene Oxide Micropatterns for a Bio-Subretinal Chip
(2018-09-19)
Yang, Jia-Wei
;
Tseng, Ming-Liang
;
Fu, Yu-Min
;
Kang, Che-Hao
;
Cheng, Yu-Ting
Recently, implantable artificial subretinal chips using electronic components have replaced photoreceptors to serve as the most feasible treatment for retinal diseases. As such a chip that is meant to be implanted and used for very long periods, growing retinal cells on it to improve the electrical stimulation efficiency and attraction of neuronal elements remains a challenge. Here, an inkjet printing technology is employed to create graphene oxide (GO) micropatterns onto microelectrodes of a photovoltaic-powered implantable retinal chip. These GO micropatterns allow human retinal pigment epithelium (RPE) cells to specially attach and grow in each microelectrode. In addition, the cell proliferation, viability, and tight junction of RPE cells are improved during culturing. The development of a simple surface-coating technology would pave the way for the development of the first fully integrated and encapsulated retinal prostheses with biocompatible on-chip microelectrodes for long-term implantation, which could be effectively applied in retina tissue engineering and therapy.