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Browsing by Author "Kuo, Yu-Chieh"

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    Low-temperature method for enhancing sputter-deposited HfO2 films with complete oxidization
    (2007-07-02)
    Tsai, Chih-Tsung
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    Chang, Ting-Chang
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    Liu, Po-Tsun
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    Yang, Po-Yu
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    Kuo, Yu-Chieh
    A low-temperature method, supercritical CO2 fluid (SCF) technology, is proposed to improve the dielectric properties of ultrathin hafnium oxide (HfO2) film at 150 degrees C without significant formation of parasitic oxide at the interface between HfO2 and Si substrate. In this research, the HfO2 films were deposited by dc sputter at room temperature and post-treated by SCF which is mixed with 5 vol % propyl alcohol and 5 vol % H2O. From high-resolution transmission electron microscopy image, the interfacial oxide of SCF-treated HfO2 film is only 5 angstrom thick. Additionally, the enhancements in the qualities of sputter-deposited HfO2 film after SCF process are exhibited by x-ray photoelectron spectroscopy and capacitance-voltage (C-V) measurement. (c) 2007 American Institute of Physics.