Browsing by Author "Lai, Hui-Lung"

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Effects of low-temperature Si buffer thickness and SiGe oxidation on sensitivity of Si1-xGex nanowire
(2015-06-01)
Lai, Yi-Lung
;
Chang, Tai-Yuan
;
Chang, Kow-Ming
;
Chen, Chu-Feng
;
Lai, Chiung-Hui
Si1-xGex nanowire biosensors are attractive for their high sensitivity due to the large surface-to-volume ratio, high carrier mobility, and silicon compatibility. In this work, we study the effect of the thickness of the low-temperature Si (LT-Si) buffer layer on an insulator on the sensitivity of oxidized Si1-xGex nanowire samples with different Ge contents by increasing the Si buffer thickness from 20 to 60 nm. 3-Aminopropyltrimethoxy-silane (APTMS) was used as a biochemical reagent. It was demonstrated that, with the proper Ge content and LT-Si buffer thickness, the sensitivity of the Si1-xGex nanowire is high and it can be further improved by Si1-xGex oxidation. This can be attributed to the reduction of the diameter to the nanometer order, which gives rise to an increased surface-to-volume ratio and further enhances the sensitivity of the biosensor. (C) 2015 The Japan Society of Applied Physics
Investigation of Defect Free SiGe Nanowire Biosensor Modified by Dual Plasma Technology
(2016-02)
Chen, Yi-Ming
;
Chang, Tai-Yuan
;
Lai, Chiung-Hui
;
Chang, Kow-Ming
;
Chen, Chu-Feng
Semiconductor nanowires (NWs) have been extensively investigated and discussed in various fields due to their unique physical properties. In this paper, we successfully produce SiGe NWs biosensor by VLSI technology. We propose the dual plasma technology with CF4 plasma pre-treatment and N-2 plasma post-treatment for repairs of defects as well as optimization of SiGe NWs biosensor. The results indicate that sensitivity (S) of the biosensor with dual plasma technology has significantly improved at least 32.8%, suitable for producing industrial SiGe NWs biosensor in the future.