Browsing by Author "Lai, Tung-Yen"

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Broadband Omnidirectional Light Trapping in Gold-Decorated ZnO Nanopillar Arrays
(2017-04-05)
Chang, Yuan-Ming
;
Lin, Man-Ling
;
Lai, Tung-Yen
;
Chen, Chang-Hung
;
Lee, Hsin-Yi
The photoluminescence (PL) and reflectivity characteristics of zinc oxide nanopillars- (ZnO-NPs) grown on indium tin oxide (ITO)-coated glasses were investigated. The room temperature PL showed bright -white -light emission for the undoped ZnO-NPs grown at 600 degrees C, suggesting the close relation between the optical characteristic and "the growth conditions being, carried out for,obtaining the present ZnO-NPs. The reflectivity of the as -grown ZnO-NPs array was about, similar to 29% with the wavelength of the incident light ranging from 200 to 1800 nm. Nevertheless, the reflectance reduced significantly to less than 9.9% when a layer of gold (Au) was deposited on ZnO=NPg by sputtering for 5 min, corresponding to more than 65% reduction in Au -coated ZnQ-NPs (Au/ZnO-NPs). Moreover, the angle -resolved reflectance measurement's on the present Au/ZnO-NPs array show an omnidirectional light -trapping characteristic. These remarkable characteristics, broadband and omnidirectional light -trapping -of Ati/ZnO-NPs, are attributed to the extended effective optical path of the incident light due to subwavelength scattering resulting,from the presence of Au nanoparticics.
Demonstration of 40-nm Channel Length Top-Gate p-MOSFET of WS2 Channel Directly Grown on SiOx/Si Substrates Using Area-Selective CVD Technology
(2019-12-01)
Chung, Yun-Yan
;
Lu, Kuan-Cheng
;
Cheng, Chao-Ching
;
Li, Ming-Yang
;
Lin, Chao-Ting
For high-volume manufacturing of 2-D transistors, area-selective chemical reaction deposition (CVD) growth is able to provide good-quality 2-D layers and may be more effective than exfoliation from bulk crystals or wet/dry transfer of large-area as-grown 2-D layers. We have successfully grown continuous and uniform WS2 film comprising around seven layers by area-selective CVD approach using patterned tungsten source/drain metals as the seeds. The growth mechanism is inferred and supported by the transmission electron microscope (TEM) images, as well. The first top-gate MOSFETs of CVD-WS2 channels on SiOx/Si substrates are demonstrated to have good short channel electrical characteristics: ON-/OFF-ratio of 10(6), a subthreshold swing of 97 mV/decade, and nearly zero drain-induced barrier lowering (DIBL).
Field Emission Properties of Gold Nanoparticle-Decorated ZnO Nanopillars
(2012-12-01)
Chang, Yuan-Ming
;
Lin, Man-Ling
;
Lai, Tung-Yen
;
Lee, Hsin-Yi
;
Lin, Chih-Ming
The structural and optoelectronic properties of ZnO nanopillars (ZnO-NPs) grown on Si substrates by the vapor transport deposition method were investigated. In particular, by varying the deposition duration and hence the morphology of the vertically aligned ZnO-NPs, the resultant field emission characteristics were systematically compared. In addition to identifying the advantageous field emission properties exhibited in the pencil-like ZnO-NPs, we observed that by adhering Au nanoparticles on the surface of the ZnO-NPs the turn-on field and the maximum current density can be drastically improved from 3.15 V/mu m and 0.44 mA/cm(2) at 5 V/mu m for the best ZnO-NPs to 2.65 V/mu m and 2.11 mA/cm(2) at 5 V/mu m for Au/ZnO-NPs, respectively. The enhancement of field emission characteristics that resulted from Au-nanoparticle decoration is discussed on the basis of charge-transfer-induced band structure modifications.
First demonstration of 40-nm channel length top-gate WS2 pFET using channel area-selective CVD growth directly on SiOx/Si substrate
(2019-01-01)
Cheng, Chao-Ching
;
Chung, Yun-Yan
;
Li, Ming-Yang
;
Lin, Chao-Ting
;
Li, Chi-Feng
Area-selective channel material growth for 2D transistors is more desirable for volume manufacturing than exfoliation or wet/dry transfer after large area growth. We demonstrate the first top-gate WS(2)p-channel field-effect transistors (p-FETs) fabricated on SiOx/Si substrate using channel area-selective CVD growth. Smooth and uniform WS2 comprising approximately 6 layers was formed by area-selective CVD growth in which a patterned tungsten-source/drain served as the seed for WS2 growth. For a 40 nm gate length transistor, the device has impressive electrical characteristics: on/off ratio of similar to 10(6), a S.S. of similar to 97 mV/dec.. and nearly zero DIBL.
Threshold Vacuum Switch (TVS) on 3D-Stackable and 4F(2) Cross-Point Bipolar and Unipolar Resistive Random Access Memory
(2012-01-01)
Ho, ChiaHua
;
Huang, Hsin-Hau
;
Lee, Ming-Taou
;
Hsu, Cho-Lun
;
Lai, Tung-Yen
A 3D stackable and bidirectional Threshold Vacuum Switching (TVS) selector using the same WO x material as the RRAM element is reported. It provides the highest reported current density of >10(8) A/cm(2) and the highest selectivity of >10(5). Stress test at high current density indicates >10(8) cycle capability for Reset/Set operation. A mechanism based on recombination of oxygen-ions and vacancies is proposed for the observed volatile switching of TVS. Utilizing the threshold characteristics of the TVS selector, a two-step reading waveform offers potential for 3D-stackable and 4F(2) cross-point RRAM applications.