Browsing by Author "Lau, Kei May"
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Item type:Item, InGaN-based light-emitting diodes grown and fabricated on nanopatterned Si substrates(2010-05-17) ;Deng, Dongmei ;Yu, Naisen ;Wang, Yong ;Zou, XinboKuo, Hao-ChungInGaN-based light-emitting diodes (LEDs) were grown and fabricated on nanoscale patterned Si (111) substrates (NPSi). Using anodized aluminum oxide as the etch mask, the NPSi was prepared with an average nanopore diameter of 150 nm and interpore distance of 120 nm. LEDs grown on NPSi exhibit relaxed tensile stress relative to the ones grown on microscale patterned Si (111) substrates (MPSi). Nanoheteroepitaxial lateral overgrowth was significantly promoted on NPSi, which led to extensive dislocation bending and annihilation. The devices made on NPSi exhibit lower leakage current and higher light output power as compared with those on MPSi. (C) 2010 American Institute of Physics. [doi: 10.1063/1.3427438]Item type:Item, Material characteristics of InGaN based light emitting diodes grown on porous Si substrates(2011-01-15) ;Deng, Dongmei ;Chiu, Ching-Hsueh ;Kuo, Hao-Chung ;Chen, PengLau, Kei MayInGaN/GaN multiple quantum wells light emitting diodes (LEDs) with 2 mu m thick crack-free GaN buffer layers were grown on porous Si substrates by metalorganic chemical vapor deposition. The material properties of LEDs grown on porous Si were studied in comparison with LEDs grown on grid-patterned Si. The (1 0 (1) over bar 5) asymmetric reciprocal space mapping (RSM) results indicate that LEDs grown on porous Si have less lattice tilt or distortion than those grown on grid-patterned Si. Both RSM and micro-photoluminescence (micro-PL) measurements suggest that multiple quantum wells grown on porous Si are less stressed. Mechanisms behind this partial strain relaxation are discussed. (C) 2010 Elsevier B.V. All rights reserved.Item type:Item, Solid-State Lighting with High Brightness, High Efficiency, and Low Cost(2014-01-01) ;Horng, Ray-Hua ;Lau, Kei May ;Kuo, Hao-Chung ;Tansu, Nelson光電工程學系Item type:Item, Study of GaN-based light-emitting diodes grown on chemical wet-etching-patterned sapphire substrate with V-shaped pits roughening surfaces(2008-05-01) ;Lee, Ya-Ju ;Kuo, Hao-Chung ;Lu, Tien-Chang ;Wang, Shing-ChungNg, Kar WaiWe investigate the mechanism responding for performance enhancement of gallium nitride (GaN)-based light-emitting diode (LED) grown on chemical wet-etching-patterned sapphire substrate (CWE-PSS) with V-Shaped pit features on the top surface. According to temperature-dependent photoluminescence (PL) measurement and the measured external quantum efficiency, the structure can simultaneously enhance both internal quantum efficiency and light extraction efficiency. Comparing to devices grown on planar sapphire substrate, the threading dislocation defects of LED grown on CWE-PSS are reduced from 1.28 x10(9)/cm(2) to 3.62 x10(8)/cm(2), leading to a 12.5% enhancement in internal quantum efficiency. In terms of the theoretical computing of radiation patterns, the V-Shaped pits roughening surface can be thought of as a strong diffuser with paraboloidal autocorrelation function, increasing the escape probability of trapped photons and achieving a 20% enhancement in light extraction efficiency. Moreover, according to the measurement of optical diffraction power, CWE-PSS demonstrated superior guided light extraction efficiency than that of planar sapphire substrate, thus an extra 7.8% enhancement in light extraction efficiency was obtained. Therefore, comparing to the conventional LED, an overall 45% enhancement in integrated output power was achieved.