Browsing by Author "Lee, Chung-Ju"

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Dual-metal-gate-integration complementary metal oxide semiconductor process scheme using Ru positive-channel metal oxide semiconductor and TaC negative-channel metal oxide semiconductor gate electrodes
(2007-07-01)
Chang, Wen-Tung
;
Hsieh, Tsung-Eong
;
Lee, Chung-Ju
;
材料科學與工程學系
;
Department of Materials Science and Engineering
This article presents the development of a wet removal process on the integration of complementary metal oxide semiconductor (CMOS) dual metals with Ru for positive-channel metal oxide semiconductor and TaC for negative-channel metal oxide semiconductor on high-k HfO2 gate dielectric. The integration scheme focused on the wet etching capability for the first metal and the selectivity control on the high-k dielectrics under the metal gate. Using the developed chemical, ceric ammonium nitrate and nitric acid mixture used for Ru metal removal and HfO2 treated with Ar/O-2 plasma by selective diluted hydrofluoric wet etching, a CMOS dual-metal-gate structure was achieved with satisfactory device fabrication. (c) 2007 American Vacuum Society.