Browsing by Author "Lee, Yeong-Shyang"

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Development of stable micro-crystalline silicon AMLCD
(2007-01-01)
Chang, Chan-Ching
;
Chen, Chih-Hsien
;
Peng, Ya-Hui
;
Lee, Yeong-Shyang
;
Hou, Chih-Yuan
Bottom-gate microcrystalline silicon thin film transistors (mu c-Si TFTs) have been produced by the radio frequency glow discharge technique using three different plasma treatment on the interface between microcrystalline and SiN layers. Our first microcrystalline silicon TFTs have better stability at high temperature stress.
Electrical Properties of Metal-Silicon Nitride-Hydrogenated Amorphous Silicon Capacitor Elucidated Using Admittance Spectroscopy
(2008-12-01)
Hsieh, Ming-Ta
;
Chen, Jenn-Fang
;
Yen, Kuo-Hsi
;
Zan, Hsiao-Wen
;
Chang, Chan-Ching
Detailed admittance spectroscopy was performed on a metal-silicon nitride-hydrogenated amorphous silicon (MIAS) structure. On the basis of the properties of hydrogenated amorphous silicon (a-Si:H), three simplified equivalent circuit models under various operating conditions (accumulation, depletion and full depletion) are presented along with an alternative direct measurement method at room temperature. Admittance spectroscopy shows that the interface states density between silicon nitride (SiN(x)) and a-Si:H can be determined from the depletion equivalent circuit model. The resisivity and activation energy of a-Si:H can also be obtained using the accumulation and depletion equivalent circuit models. These models can be employed easily to monitor the fabrication parameters of thin-films transistors (TFTs) and to accurately and directly obtain the capacitance model parameters of TFTs. [DOI: 10.1143/JJAP.47.8714]
Study the electrical properties of non-crystalline semiconductor by admittance spectroscopy
(2007)
Hsieh, Ming-Ta
;
Chang, Chan-Ching
;
Chen, Jenn-Fang
;
Zan, Hsiao-Wen
;
Yen, Kuo-Hsi
We developed three types of equivalent circuit model to investigate the electrical properties of non-crystalline semiconductor. From the equivalent circuit models, parameters of non-crystalline semiconductor can be easily obtained by admittance spectroscopy. This method also can be utilized in the optimization of device process as well.