Browsing by Author "Lee, Zhen-You"

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Determining thickness of films on a curved substrate by use of ellipsometric measurement
(2008-01-01)
Han, Chien-Yuan
;
Lee, Zhen-You
;
Chao, Yu-Faye
;
光電工程學系
;
Department of Photonics
The three intensity polarizer-sample-analyzer imaging ellipsometry is used to measure the ellipsometric parameters (Psi, Delta). In addition to the ellipsometric parameters, we introduce an extra angle alpha to measure the of the azimuth deviation of polarizer. After careful calibration, we found this deviation can indicate how much the surface normal slanted from the plane; then it can be used to deduce the thickness profile coated on a cylindrical lens. Using this technique, we. not only can determine the radius curvature of the curved surface, we also can calculate the thickness of the thin film coated on a curved surface.
Determining thickness of films on a curved substrate by use of ellipsometric measurements
(2009-06-10)
Han, Chien-Yuan
;
Lee, Zhen-You
;
Chao, Yu-Faye
;
光電工程學系
;
Department of Photonics
A three-intensity measurement technique has been employed in polarizer-sample-analyzer imaging ellipsometry to measure the two-dimensional ellipsometric parameters of a coated cylindrical lens. Since azimuth deviation a of a polarizer can also be measured with this three-intensity measurement technique, we tilted a well-calibrated thin-film wafer to identify the orientation of the measured a with respect to the incident plane. Using the analytic property of this measurement technique, we can correct the deviation and determine the thickness profile of the thin film coated on a cylindrical lens. (C) 2009 Optical Society of America