Browsing by Author "Lin, Kun Chih"
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Item type:Item, New patterning method for pentacene-based TFTs by using AIN dielectric and O-2 plasma treatment(2007) ;Zan, Hsiao Wen ;Tu, Ting Yuan ;Chou, Cheng Wei ;Yen, Kuo HsiWang, Chung HwaPentacene patterning on aluminum nitride (AIN) dielectric by adjusting the surface energy was discussed. By using conventional photo resist to protect the channel area, the surface energy of the remaining area was altered by the 02 plasma treatment. Then, after pentacene deposition, water dipping was used to remove the pentacene on 02 plasma-treated area. The adhesion energy, intrusion energy were analyzed to explain the mechanism of this patterning process. The variation of intrusion energy due to different surface energies was found to be the key issue for successful pentacene patterning. AIN-OTFTs with the proposed pentacene patterning technology were also demonstrated.Item type:Item, The modified bias-stress effect in organic TFTs(2007) ;Zan, Hsiao-Wen ;Kao, Shih-Chin ;Pan, Huang-Wei ;Lin, Kun ChihHsu, Chen ChouIn this paper, the influence of drain bias on the bias stress effect in pentacene-based organic thin-film transistors was studied. It was found that, under gate bias stress measurement, the threshold voltage shift was strongly affected by the drain bias due to the varied channel charge amount. As a result, conventional stretched-exponential function was modified with a channel charge normalization factor to describe the dependence of threshold voltage shift on the stressing time. The result is important for the design of organic electronic or OTFT active-matrix display, in which the influence of both the gate and the drain biases has to be considered.