Browsing by Author "Lin, Po-Chun"

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Carrier localization degree of In(0.2)Ga(0.8)N/GaN multiple quantum wells grown on vicinal sapphire substrates
(2009-01-01)
Li, Zhen-Yu
;
Lo, Ming-Hua
;
Chiu, Ching-Hua
;
Lin, Po-Chun
;
Lu, Tien-Chang
In this work, we have grown In(0.2)Ga(0.8)N/GaN multiple quantum well (MQWs) epitaxial structure on vicinal sapphire substrates by low pressure metal-organic chemical vapor deposition and investigated the relationship between carrier localization degree and vicinal angles of sapphire substrates. The optical analysis confirmed that the In(0.2)Ga(0.8)N/GaN MQWs grown on 0.2 degrees-off sapphire substrate exhibited the smallest carrier localization degree and more ordered In(0.2)Ga(0.8)N/GaN MQW structure. In addition, mechanisms for carrier localization in In(0.2)Ga(0.8)N/GaN MQWs grown on vicinal substrate were discussed based on the results obtained from the power and temperature dependent photoluminescence measurements. The Raman spectrum showing the in-plane compressive stress of the GaN epitaxial structures grown on vicinal sapphire substrates revealed the relation between the dislocation density and the carrier localization degree in MQWs. From transmission electron microscopy images, the threading dislocation density (TDD) of In(0.2)Ga(0.8)N/GaN MQWs grown on 0.2 vicinal sapphire substrate at the bottom of n-GaN layer was about 9.4 X 10(8) cm(-2) and reduced to 3.0 X 10(8) cm(-2) at the top of n-GaN layer. We also obtained the TDD of 5.6 X 10(7) cm(-2) in the MQW region and only 1.0 X 10(7) cm(-2) in the p-GaN region. Based on the results mentioned above, 0.2 degrees-off substrate can offer In(0.2)Ga(0.8)N/GaN MQW blue light-emitting diode structures with benefits, such as high crystal quality, low defects, and small carrier localization degree. (C) 2009 American Institute of Physics. (DOI: 10.1063/1.3055264)
Carrier localization degree of In0.2Ga0.8N/GaN multiple quantum wells grown on vicinal sapphire substrates
(2009-01-01)
Li, Zhen-Yu
;
Lo, Ming-Hua
;
Chiu, Ching-Hua
;
Lin, Po-Chun
;
Lu, Tien-Chang
In this work, we have grown In0.2Ga0.8N/GaN multiple quantum well (MQWs) epitaxial structure on vicinal sapphire substrates by low pressure metal-organic chemical vapor deposition and investigated the relationship between carrier localization degree and vicinal angles of sapphire substrates. The optical analysis confirmed that the In0.2Ga0.8N/GaN MQWs grown on 0.2 degrees-off sapphire substrate exhibited the smallest carrier localization degree and more ordered In0.2Ga0.8N/GaN MQW structure. In addition, mechanisms for carrier localization in In0.2Ga0.8N/GaN MQWs grown on vicinal substrate were discussed based on the results obtained from the power and temperature dependent photoluminescence measurements. The Raman spectrum showing the in-plane compressive stress of the GaN epitaxial structures grown on vicinal sapphire substrates revealed the relation between the dislocation density and the carrier localization degree in MQWs. From transmission electron microscopy images, the threading dislocation density (TDD) of In0.2Ga0.8N/GaN MQWs grown on 0.2 vicinal sapphire substrate at the bottom of n-GaN layer was about 9.4 X 10(8) cm(-2) and reduced to 3.0 X 10(8) cm(-2) at the top of n-GaN layer. We also obtained the TDD of 5.6 X 10(7) cm(-2) in the MQW region and only 1.0 X 10(7) cm(-2) in the p-GaN region. Based on the results mentioned above, 0.2 degrees-off substrate can offer In0.2Ga0.8N/GaN MQW blue light-emitting diode structures with benefits, such as high crystal quality, low defects, and small carrier localization degree. (C) 2009 American Institute of Physics. (DOI: 10.1063/1.3055264)
Enhancing the Emission Efficiency of In(0.2)Ga(0.8)N/GaN MQW Blue LED by Using Appropriately Misoriented Sapphire Substrates
(2009-01-01)
Li, Zhen-Yu
;
Uen, Wu-Yih
;
Lo, Ming-Hua
;
Chiu, Ching-Hua
;
Lin, Po-Chun
In this paper, we report the fabrication of an In(0.2)Ga(0.8)N/GaN multiple-quantum-well (MQW) structure on vicinal sapphire substrates with a very small offset angle of 0-1 degrees by low-pressure metallorganic chemical vapor deposition. Our study demonstrates that the quality of the In(0.2)Ga(0.8)N/GaN MQW structure is very sensitive to the offset angle of the vicinal substrate. High-resolution X-ray diffraction analyses demonstrated high-order satellite peaks and clear fringes between them for all MQW structures fabricated, from which the interface roughness (IRN) was estimated. The IRN of the In(0.2)Ga(0.8)N/GaN MQW structure fabricated on 0.2 degrees off sapphire substrate was determined as 1.36% of the quantum well layer period. Besides, reciprocal lattice mapping was employed to examine the strain status of the MQW. The lattice relaxation of the same specimen mentioned above was estimated to be 7.4x10(-5). It is therefore manifested that an In(0.2)Ga(0.8)N/GaN MQW structure with abrupt interfaces and good layer periodicity was grown. From it, a shortest radiative lifetime of 14.2 ns and a lowest fluctuation of 5.6 meV in the emission energy of micro-photoluminescence mapping were achieved. In addition, superior material qualities of the whole film fabricated on 0.2 degrees off substrate were recognized by cross-sectional transmission electron microscopy. Based on the results mentioned above, a high-quality In(0.2)Ga(0.8)N/GaN MQW blue light, emitting diode (LED) has been fabricated on 0.2 degrees off substrate, which demonstrated a strong room-temperature electroluminescence emission at the wavelength of 465 nm and with the full width at half maximum of only 19 nm. The same device also showed an output power of 13.4 mW and an external quantum efficiency of 19.2%. Both these characteristics are improved drastically compared with the devices fabricated on the substrates with other offset angles. Conclusively, the use of an appropriately misoriented sapphire substrate is suggested to be effective for elevating the emission efficiency of In(0.2)Ga(0.8)N/GaN MQW blue LED fabricated thereon.
Enhancing the Emission Efficiency of In0.2Ga0.8N/GaN MQW Blue LED by Using Appropriately Misoriented Sapphire Substrates
(2009-01-01)
Li, Zhen-Yu
;
Uen, Wu-Yih
;
Lo, Ming-Hua
;
Chiu, Ching-Hua
;
Lin, Po-Chun
In this paper, we report the fabrication of an In0.2Ga0.8N/GaN multiple-quantum-well (MQW) structure on vicinal sapphire substrates with a very small offset angle of 0-1 degrees by low-pressure metallorganic chemical vapor deposition. Our study demonstrates that the quality of the In0.2Ga0.8N/GaN MQW structure is very sensitive to the offset angle of the vicinal substrate. High-resolution X-ray diffraction analyses demonstrated high-order satellite peaks and clear fringes between them for all MQW structures fabricated, from which the interface roughness (IRN) was estimated. The IRN of the In0.2Ga0.8N/GaN MQW structure fabricated on 0.2 degrees off sapphire substrate was determined as 1.36% of the quantum well layer period. Besides, reciprocal lattice mapping was employed to examine the strain status of the MQW. The lattice relaxation of the same specimen mentioned above was estimated to be 7.4x10(-5). It is therefore manifested that an In0.2Ga0.8N/GaN MQW structure with abrupt interfaces and good layer periodicity was grown. From it, a shortest radiative lifetime of 14.2 ns and a lowest fluctuation of 5.6 meV in the emission energy of micro-photoluminescence mapping were achieved. In addition, superior material qualities of the whole film fabricated on 0.2 degrees off substrate were recognized by cross-sectional transmission electron microscopy. Based on the results mentioned above, a high-quality In0.2Ga0.8N/GaN MQW blue light, emitting diode (LED) has been fabricated on 0.2 degrees off substrate, which demonstrated a strong room-temperature electroluminescence emission at the wavelength of 465 nm and with the full width at half maximum of only 19 nm. The same device also showed an output power of 13.4 mW and an external quantum efficiency of 19.2%. Both these characteristics are improved drastically compared with the devices fabricated on the substrates with other offset angles. Conclusively, the use of an appropriately misoriented sapphire substrate is suggested to be effective for elevating the emission efficiency of In0.2Ga0.8N/GaN MQW blue LED fabricated thereon.
Fracture of cobalt chrome, fully-coat beaded femoral revision long stem, a clinical outcomes study
(2018-02-01)
Chang, Chih-Hsiang
;
Lin, Po-Chun
;
Shih, Cheng-Min
;
Chen, Chun-Chieh
;
Hsieh, Pang-Hsin
Background: Femoral bone loss during revision total hip arthroplasty poses a challenging problem. Bypass fixation over the diaphysis has achieved clinical success in cases of proximal femoral bone loss. Fracture of cementless, fully bead-coated femoral stem is an uncommon complication. The purpose of this study is to analyze the patients with and without fracture stem and find out the possible risk factors. Methods: From 2006 to 2012, a total of 251 revision long stems (Zimmer, Warsaw, IN) were implanted. In the same period, 17 broken stems that underwent treatment were included for analysis. Patients' demographic data, pattern of femoral bone loss, stem size, medial calcar support in the proximal region of the stem, and the timing of stem breakage were collected and analyzed. Results: The stem size in patients with a broken stem was smaller (p < 0.001), and medial calcar defect was 12.4% and 100% (p < 0.001), respectively. The bone defect was greater in broken group (p = 0.024). The mean duration between revision surgery and stem breakage was 58.07 +/- 36.98 months. Smaller stem size, greater bone defect, and inadequate medial calcar bone support were major risk factors for stem breakage. Conclusions: Bypass fixation in the distal diaphysis with a long stem prosthesis without adequate bone support over medial calcar area may cause stress concentration in the long stem and a fatigue fracture. Use of a smaller prosthesis is the major risk of stem broken. It is essential to repair the proximal femoral bone deficiency and implant selection for better metaphyseal engagement to prevent further stem complications.