Browsing by Author "Lin, Tsang-Lang"

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Assessment of interface roughness during plasma etching through the use of real-time ellipsometry
(2011-01-15)
Han, Chien-Yuan
;
Lai, Chien-Wen
;
Chao, Yu-Faye
;
Leou, Ke-Ciang
;
Lin, Tsang-Lang
Real-time in situ ellipsometry was used to investigate the etching of SiO(2)/silicon wafers with a high concentration of Cl(2). We monitored the temporal trajectory of the ellipsometric parameter Delta and then selected several points for ex situ study using atomic force microscopy (AFM). There was a clearly observable transition period in the trajectory near the endpoint of the SiO(2)/Si interface. We studied the relationship between the ellipsometric parameter Delta and the same point in the AFM ex situ measurements. Three stages, thin film, the interface layer, and the substrate, were analyzed in this work. (C) 2010 Elsevier B.V. All rights reserved.
Improved Catalytic Performance of Pt Supported on Multi-Wall Carbon Nanotubes as Cathode for Direct Methanol Fuel Cell Applications Prepared by Dual-stepped Surface Thiolation Processes
(2009-12-01)
Chen, Tsan-Yao
;
Lin, Tsang-Lang
;
Chen, Chien-Chung
;
Chen, Chieng-Ming
;
Chen, Chia-Fu
This study develops a simple surface modification process for modifying the MWCNT surface by thiolation reaction after the conventional nitric acid treatment for strong interface attachment of Pt NPs and improved dispersion onto MWCNTs. The thiolated MWCNTs (Pt/MWCNTs) showed significant improvement of methanol electro-oxidation activity compared with that treated only by nitric acid solution. The prepared electrode with thiolated MWCNTs was used as the cathode for assembling MEA for DMFC single-cell applications. Testing results indicate that the thiolated MWCNT cathode can improve the power density of MEA by more than 300% (from 4.6 to 20.6 mW cm(-2)) compared with that treated only by conventional nitric acid reactions. The dual-step modification process for MWCNT surface treatment showed significant improvement over the convention nitric acid treatment and can be successfully used in DMFC applications.