Browsing by Author "Lin, Wan-Jhen"

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Dynamic observation on the growth behaviors in manganese silicide/silicon nanowire heterostructures
(2015-01-01)
Hsieh, Yu-Hsun
;
Chiu, Chung-Hua
;
Huang, Chun-Wei
;
Chen, Jui-Yuan
;
Lin, Wan-Jhen
Metal silicide nanowires (NWs) are very interesting materials with diverse physical properties. Among the silicides, manganese silicide nanostructures have attracted wide attention due to their several potential applications, including in microelectronics, optoelectronics, spintronics and thermoelectric devices. In this work, we exhibited the formation of pure manganese silicide and manganese silicide/silicon nanowire heterostructures through solid state reaction with line contacts between manganese pads and silicon NWs. Dynamical process and phase characterization were investigated by in situ transmission electron microscopy (in situ TEM) and spherical aberration corrected scanning transmission electron microscopy (Cs-corrected STEM), respectively. The growth dynamics of the manganese silicide phase under thermal effects were systematically studied. Additionally, Al2O3, serving as the surface oxide, altered the growth behavior of the MnSi nanowire, enhancing the silicide/Si epitaxial growth and effecting the diffusion process in the silicon nanowire as well. In addition to fundamental science, this significant study has great potential in advancing future processing techniques in nanotechnology and related applications.
Unique amorphization-mediated growth to form heterostructured silicide nanowires by solid-state reactions
(2019-05-05)
Lin, Wan-Jhen
;
Lin, Ting-Yi
;
Huang, Chun-Wei
;
Ting, Yi-Hsin
;
Tsai, Tsung-Chun
Transition metal silicide nanowires exhibit low resistivity, great thermal stability and excellent mechanical strength, contributing to their applications as interconnection and contact materials for future integrated circuits devices. In this work, we successfully fabricated two kinds of chromium silicide/silicon heterostructure nanowires through solid state reactions - bare Si/Cr3Si nanowires and Si/Cr5Si3-Al2O3 core-shell nanowires. The growth behaviors and diffusion mechanisms of the two silicide heterostructure nanowires were investigated with in-situ TEM at 700 degrees C. During the growth of chromium silicide nanowires, unique amorphous Si phase would form first in front of silicide nanowires. Also, we found that oxide-shell could control the diffusion process in silicon nanowires. With oxide-shell, compression stress would restrain the growth of chromium silicide in the radial direction but accelerate its growth rate in the axial direction. Additionally, Al2O3 shell reduced the radial expansion of chromium silicide nanowires and hindered Cr-rich phases with Cr5Si3 appearing as the first phase. The crystal structures of the nanowires have been identified to be single-crystalline A15 and D8m type structure of the intrinsic Cr3Si nanowires and Cr5Si3 nanowires, respectively. In addition to fundamental science, the significant study is beneficial for future processing techniques in nanotechnology and related applications. (C) 2019 Elsevier Ltd.