Browsing by Author "Lin, Y. P."

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Enhanced spectral response by silicon nitride index matching layer in amorphous silicon thin-film solar cells
(2012-09-01)
Hsu, C. H.
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Lin, Y. P.
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Hsu, H. J.
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Tsai, C. C.
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光電工程學系
We employed the low temperature hydrogenated amorphous silicon nitride (a-SiNx:H) prepared by plasma-enhanced chemical vapor deposition as a refractive index (n) matching layers in a silicon-based thin-film solar cell between glass (n = 1.5) and the transparent conducting oxide (n = 2). By varying the stoichiometry, refractive index and thickness of the a-SiNx:H layers, we enhanced the spectral response and efficiency of the hydrogenated amorphous silicon thin-film solar cells. The refractive index of a-SiNx:H was reduced from 2.32 to 1.78. Optimizing the a-SiNx:H thickness to 80 nm increased the J(SC) from 8.3 to 9.8 mA/cm(2) and the corresponding cell efficiency increased from 4.5 to 53%, as compared to the cell without the a-SiNx:H index-matching layer on planar substrate. The a-SiNx:H layers with graded refractive indices were effective for enhancing the cell performance. (C) 2012 Elsevier B.V. All rights reserved.
Mechanical bending effect on the photo leakage currents characteristic of amorphous silicon thin film transistors
(2010-11-01)
Wang, M. C.
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Tsao, S. W.
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Chang, T. C.
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Lin, Y. P.
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Liu, Po-Tsun
The photo leakage current (I(PLC)) characteristic of a-Si:H TFTs under different bending strains has been studied. The larger I(PLC) of a-Si:H TFTs under the outward bending strain is due to larger conductivity of a-Si:H, stemmed from the shift up of Fermi level (E(F)). Experimental results show the I(PLC) of a-Si:H TFTs under the outward bending strain is larger than that of flattened and inward bending a-Si:H TFTs in the density of states (DOS) limited region, stemmed from the lower recombination centers present in outward bending a-Si:H material. Furthermore, the extracted smaller activity energy (E(a)) of a-Si:H TFTs under the outward bending strain also confirmed the shift of E(F). (C) 2010 Elsevier Ltd. All rights reserved.
Mechanical bending effect on the photo leakage currents characteristic of amorphous silicon thin film transistors
(2010-11-01)
Wang, M. C.
;
Tsao, S. W.
;
Chang, T. C.
;
Lin, Y. P.
;
Liu, Po-Tsun
The photo leakage current (I(PLC)) characteristic of a-Si:H TFTs under different bending strains has been studied. The larger I(PLC) of a-Si:H TFTs under the outward bending strain is due to larger conductivity of a-Si:H, stemmed from the shift up of Fermi level (E(F)). Experimental results show the I(PLC) of a-Si:H TFTs under the outward bending strain is larger than that of flattened and inward bending a-Si:H TFTs in the density of states (DOS) limited region, stemmed from the lower recombination centers present in outward bending a-Si:H material. Furthermore, the extracted smaller activity energy (E(a)) of a-Si:H TFTs under the outward bending strain also confirmed the shift of E(F). (C) 2010 Elsevier Ltd. All rights reserved.
The instability of a-Si : H TFT under mechanical strain with high frequency ac bias stress
(2007)
Wang, M. C.
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Chang, T. C.
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Liu, Po-Tsun
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Tsao, S. W.
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Lin, Y. P.
The instability of amorphous Si thin film transistors under uniaxial strain has been studied. Compared to the effect of tensile bias stress, larger threshold voltage shift is observed under compressive bias stress. These results are related to the damage of weak Si-Si bonds during the ac bias stress. However, the V-th shift of devices on the re-flattened substrate is larger after tensile strain than that of compressive strain. In addition, the defeat diminished effect of tensile situation is decreased after re-flattening the device. Therefore, after re-flattening the substrate the Vth shift resulting from tensile bias stress is larger than that of the compressive one. (c) 2007 The Electrochemical Society.