Browsing by Author "Lin, Ya-wen"
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Item type:Item, Investigation of Efficiency Droop for UV-LED with N-type AlGaN Layer(2012-01-01) ;Tu, Po-Min ;Chang, Jet-Rung ;Huang, Shih-Cheng ;Yang, Shun-KueiLin, Ya-wenThe efficiency droop in InGaN-based 380nm UV light emitting device (LED) with n-GaN and n-AlGaN underlayer grown on sapphire substrate by metal-organic chemical vapor deposition (MOCVD) was investigated. From simulation result of high resolution x-ray diffraction (HRXRD) omega-2 theta. curve by using dynamical diffraction theory, the Al composition in the n-AlGaN layer was determined to be about 3%. The experimental results of temperature dependent photoluminescence (PL) demonstrated that the internal quantum efficiency (IQE) of n-GaN and n-AlGaN UV-LEDs are 43% and 39%, respectively, which are corresponding to an injected carrier density of 8.5 x 10(17) #/cm(3). It could be explained that the crystal quality of n-GaN is better than of n-AlGaN. In addition, the observation of pit density from atomic force microscopy (AFM) surface morphology is consistent with the interpretation. It was well-known that the pits appearing on the surface in the virtue of the threading dislocations. Thus, it means that defects induce the non-radiative centers and deteriorate the IQE of the UV-LED with n-AlGaN underlayer. Therefore, the light output power of n-GaN UV-LED is slightly higher below the forward current of 250 mA. Nevertheless, the output power was enhanced about 22% as the injection current was increased to 600 mA. Furthermore, the external quantum efficiency (EQE) of n-AlGaN UV-LED was nearly retained at the 600 mA (only 20% droop), whereas the UV-LED with n-GaN exhibits as high as 33%. We attributed this improvement to the less self-absoption by replacing n-GaN underlayer with n-AlGaN.Item type:Item, Investigation of Efficiency Droop in GaN-based UV LEDs with N-type AlGaN Underlayer(2012) ;Yang, Shun-Kuei ;Tu, Po-Min ;Huang, Shih-Cheng ;Lin, Ya-wenHsu, Chih-PengThe efficiency droop in InGaN-based 380nm UV light emitting device (LED) with n-GaN and n-AlGaN underlayer grown on sapphire substrate by metal-organic chemical vapor deposition (MOCVD) was investigated. From simulation result of high resolution x-ray diffraction (HRXRD) omega-2 theta curve by using dynamical diffraction theory, the Al composition in the n-AlGaN layer was determined to be about 3%. The experimental results of temperature dependent photoluminescence (PL) demonstrated that the internal quantum efficiency (IQE) of n-GaN and n-AlGaN UV-LEDs are 43% and 39%, respectively, which are corresponding to an injected carrier density of 8.5 x 10(17) #/cm(3). It could be explained that the crystal quality of n-GaN is better than of n-AlGaN. In addition, the observation of pit density from atomic force microscopy (AFM) surface morphology is consistent with the interpretation. It was well-known that the pits appearing on the surface in the virtue of the threading dislocations. Thus, it means that defects induce the non-radiative centers and deteriorate the IQE of the UV-LED with n-AlGaN underlayerItem type:Item, Study of Efficiency Droop in InGaN-based Near-UV LEDs with Quaternary InAlGaN Barrier(2012) ;Tu, Po-Min ;Huang, Shih-Cheng ;Lin, Ya-wen ;Yang, Shun-KueiHsu, Chih-PengIn this study, we demonstrate high efficient near-UV LEDs by replacing low-temperature AlGaN by InAlGaN barrier in active region. The efficiency droop in InGaN-based near-UV LED with AlGaN and InAlGaN barrier is investigated. High-resolution x-ray diffraction (HRXRD) and transmission electron microscopy (TEM) measurements show the two barriers are consistent with the lattice, and smooth morphology of quaternary InAlGaN layer can be observed in atomic force microscopy (AFM). Electroluminescence results indicate that the light performance of quaternary LEDs can be enhanced by 25 % and 55 % at 350 mA and 1000mA, respectively. Furthermore, simulations show that quaternary LEDs exhibit 62 % higher radiative recombination rate and low efficiency degradation of 13 % at a high injection current. We attribute this improvement to increasing of carrier concentration and more uniform redistribution of carriers.