Browsing by Author "Lu, JK"

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Characterization and lithographic parameters extraction for the modified resists
(1999)
Ko, FH
;
Lu, JK
;
Chu, TC
;
Huang, TY
;
Yang, CC
The modification of the i-line resist structure after spiking with various amount of poly(4-vinylphenol) polymer is characterized by the spectra of ultraviolet visible (UV-VIS) and gel permeation chromatography (GPC). The chemical structure of photoactive compound is found to be unchanged after modification, while slight change in the polymer chain is observed. The resist layer coated onto the wafer is characterized by various methods including n&k analyzer, Nanospec, Fourier transform infrared red (FTIR), thermogravimetric analysis (TGA), and differential scanning calorimetry (DSC) to fully evaluate the film properties in terms of porosity, thickness, vibrational spectrum, and thermal stability. Our thermal analysis results show that the resists are mainly decomposed in three stages. The photoactive compound (PAC) is found to decompose during the first stage, while the polymer decomposes during the latter stages. The resist exposure parameters, namely, A, B and C at 365 mn are determined by the absorbance measurement. The extracted parameters are further used in the resist profile simulation by PROLITH/2. It is shown that the spiking of poly(4-vinylphenol) polymer into the resist can improve the resolution and linearity for dense lines. In addition, the swing effects can be reduced by up to 35 and 31 % for dense and isolated lines after resist modification, respectively.
Evaluation of cleaning efficiency with a radioactive tracer and development of a microwave digestion method for semiconductor processes
(2000-02-29)
Lu, JK
;
Ko, FH
;
Chu, TC
;
Sun, YC
;
Wang, MY
A radioactive tracer technique was applied to investigate the effectiveness of various wet cleaning recipes in removing metallic impurities such as sodium, iron and cesium. The effects of solution temperatures and substrate types were studied. The mechanisms of the electrochemical segregation of metallic impurities between the substrate and cleaning solution were examined. The enthalpy of oxide formation and the effect of adsorption were the two reasons for the presence of surface metal impurities in the cleaning solutions. Our results indicated that SC2 and DHF can effectively remove the metallic impurities at 47 and 82 degrees C, while SPM and BOE are only effective at 82 degrees C. The gravimetric method was successfully implemented to evaluate the open-focused microwave digestion efficiency for anti-reflective coating and photoresist (PR) samples. By following the established microwave digestion method and inductively coupled plasma mass spectrometric determination, the detection limits (DLs) obtained for multi-elements were in the ng ml(-1) and sub-ng ml(-1) levels. Except for calcium, the spike recoveries of the metals were in the range 82-121% for the lithographic samples. The analytical results were found to be in reasonably good agreement with literature values, and the lithographic sample throughput can achieve up to 3.5 samples per hour for the analysis of 13 elements. (C) 2000 Elsevier Science B.V. All rights reserved.