Browsing by Author "Lu, T. C."

Now showing 1 - 20 of 104

Abnormal PL spectrum in InGaN MQW surface emitting cavity
(2008-01-01)
Chu, J. T.
;
Cheng, Y. -J.
;
Kuo, H. C.
;
Lu, T. C.
;
Wang, S. C.
We report the observation of an abnormal photoluminescent (PL) spectrum from a HeCd laser pumped InGaN multiple quantum well (MQW) vertical cavity. The device is fabricated using standard MOCVD deposition on a (0001)-oriented sapphire substrate. The layer structures are: 10nm nucleation layer, a 4um bulk GaN layer, InGaN MQWs, and a final 200nm GaN cap layer. The InGaN MQWs consist of 10 pairs of 5 nm GaN barrier and 3 run In0.1Ga0.9N well. The peak emission of the as-grown MQWs sample was similar to 420nm. A dielectric distributed Bragg reflectors (DBR) were then coated on the top layer, followed by a laser lift off from sapphire substrate, and subsequently another DBR coated on the bulk GaN bottom surface. The cavity has a quality factor of similar to 520 from 400-490nm. The device was pumped by a focused CW HeCd laser from the bulk GaN side. When the laser is focused onto the InGaN MQWs, a photoluminescent spectrum centered at the designed MOW wavelength was observed as expected. However, when the focused position was moved toward the bulk GaN region, an additional abnormal PL peak around 460nm was observed. This is far outside the designed MQW wavelength.
Abnormal PL spectrum in InGaN MQW surface emitting cavity - art. no. 69080L
(2008)
Chu, J. T.
;
Cheng, Y. -J.
;
Kuo, H. C.
;
Lu, T. C.
;
Wang, S. C.
We report the observation of an abnormal photoluminescent (PL) spectrum from a HeCd laser pumped InGaN multiple quantum well (MQW) vertical cavity. The device is fabricated using standard MOCVD deposition on a (0001)-oriented sapphire substrate. The layer structures are: 10nm nucleation layer, a 4um bulk GaN layer, InGaN MQWs, and a final 200nm GaN cap layer. The InGaN MQWs consist of 10 pairs of 5 nm GaN barrier and 3 run In0.1Ga0.9N well. The peak emission of the as-grown MQWs sample was similar to 420nm. A dielectric distributed Bragg reflectors (DBR) were then coated on the top layer, followed by a laser lift off from sapphire substrate, and subsequently another DBR coated on the bulk GaN bottom surface. The cavity has a quality factor of similar to 520 from 400-490nm. The device was pumped by a focused CW HeCd laser from the bulk GaN side. When the laser is focused onto the InGaN MQWs, a photoluminescent spectrum centered at the designed MOW wavelength was observed as expected. However, when the focused position was moved toward the bulk GaN region, an additional abnormal PL peak around 460nm was observed. This is far outside the designed MQW wavelength.
AlGaN/GaN Multiple Quantum Wells Grown By Atomic Layer Deposition
(2008)
Lo, M. H.
;
Chen, S. W.
;
Li, Z. Y.
;
Lu, T. C.
;
Kuo, H. C.
Three-pair AlGaN/GaN multiple quantum well structure with superlattice was grown using metal-organic chemical vapor deposition system. The AlGaN barrier and GaN well of the MQW were grown by atmoic layer deposition and conventional growth, respectively. (C) 2008 Optical Society of America
AlGaN/GaN multiple quantum wells grown by atomic layer deposition - art. no. 68941V
(2008)
Lo, M. H.
;
Li, Z. Y.
;
Chen, J. R.
;
Ko, T. S.
;
Lu, T. C.
A three-pair AlGaN/GaN multiple quantum well (MQW) structure with superlattices (SLs) was grown on c-plane sapphire using metal organic chemical vapor deposition (MOCVD) system. The AlGaN barrier and GaN well of the MQW structure were grown by atomic layer deposition (ALD) and conventional growth, respectively. The HRTEM and HRXRD results show the grown structure has shape interface between SLs layers and QWs with good periodicity. The AFM and SEM data show smooth surface morphology with low RMS value and low defect density. The CL measurements also indicate uniform luminescence pattern at room temperature. The AlGaN/GaN MQW with AlN/GaN SLs structure grown by ALD could be used to improve the surface morphology by effectively suppress the threading dislocation.
Analysis and Realization of TLC or even QLC Operation with a High Performance Multi-times Verify Scheme in 3D NAND Flash memory
(2018-01-01)
Lu, C. C.
;
Cheng, C. C.
;
Chiu, H. P.
;
Lin, W. L.
;
Chen, T. W.
Feasibility of multi-times verify (MTV) scheme on triple-level cell (TLC) and quad-level cell (QLC) operations of charge-trap storage 3D NAND memories is investigated comprehensively. Results reveal that random telegraph noise (RTN) and program noise are the major factors affecting lower (LB) and upper boundaries (HB) of Vt distribution, respectively. Enlargement of operation window and reduction of ECC usage with MTV scheme to mitigate RTN-induced LB tail are demonstrated on TLC and QLC operations. In addition, the impact of program noise on HB Vt under various process conditions and ISPP steps is studied experimentally and also explained by our Monte Carlo simulator. Finally, program performance and reserved margin with and without MTV scheme applied on TLC and QLC operation are demonstrated.
Azimuthal anisotropy of light extraction from photonic crystal light-emitting diodes
(2008)
Lai, Chun-Feng
;
Kuo, H. C.
;
Chao, C. H.
;
Hsueh, H. T.
;
Wang, J. -F. T.
Photonic crystal (PhC) light-emitting diodes (LEDs) exhibiting anisotropic light extraction have been investigated experimentally and theoretically. It is found that the anisotropic light extraction strongly depends on the lattice constant and orientation. Optical images of the anisotropy in the azimuthal direction are obtained using annular structure with triangular lattice. 6-fold symmetric light extraction patterns with varying number of petals are observed. More petals in multiple of 6 appear in the observed image with lattice constant increasing. This anisotropic behavior suggests a new means to optimize the PhC design of GaN LED for light extraction.
Azimuthal anisotropy of light extraction from photonic crystal light-emitting diodes
(2007)
Hsuch, H. T.
;
Wang, J. -F. T.
;
Chao, C. H.
;
Yeh, W. Y.
;
Chi, J. Y.
Photonic crystal light-emitting diodes exhibiting anisotropic light extraction efficiency have been investigated experimentally and theoretically. Images of the anisotropy in the azimuthal direction are obtained using annular structures with triangular lattice. Depending on the lattice constants, 6-fold symmetric patterns with varying number of petals are obtained.
Beam Shaping of GaN/InGaN Vertical-Injection Light Emitting Diodes via High-Aspect-Ratio Nanorod Arrays
(2009)
Tsai, M. A.
;
Yu, Peichen
;
Chao, C. L.
;
Chiu, C. H.
;
Kuo, H. C.
The enhanced light extraction and collimated output beam profile from GaN/InGaN vertical-injection light emitting diodes are demonstrated utilizing high-aspect-ratio nanorod arrays. The nanorod arrays are patterned by self-assembled silica spheres, followed by inductively-coupled-plasma reactive-ion-etching. (C) 2008 Optical Society of America
Blue GaN-based vertical cavity surface emitting lasers by CW current injection at 77K
(2009)
Kuo, H. C.
;
Chen, S. W.
;
Kao, T. T.
;
Kao, C. C.
;
Chen, J. R.
In the paper, we describe the fabrication and performance characteristics of GaN-based vertical-cavity surface-emitting lasers (VCSELs) by optical pumping and current injection. According to the employment of high-quality and high-reflectivity AlN/GaN DBRs in the whole structure, the lasing action of optically pumped GaN-based VCSELs with hybrid mirrors has been observed at room temperature. Due to the excellent results of optically pumped GaN-based VCSELs with hybrid mirrors, we further demonstrated the lasing behavior of GaN-based VCSELs by continuous-wave current injection at 77 K. The laser has one dominated blue wavelength located at 462 nm with a linewidth of about 0.15 nm and the threshold injection current at 1.4 mA. The divergence angle and polarization ratio of the GaN-based VCSELs with hybrid mirrors are about 11.7 degrees and 80 %, respectively. A larger spontaneous coupling efficiency of about 7.5x10(-2) was also measured.
Broad Angular and Spectral Anti-Reflection Employing GaN Nano-Pillar Structures
(2008)
Chiu, C. H.
;
Yu, Peichen
;
Chen, C. C.
;
Kuo, H. C.
;
Lu, T. C.
Angular and spectral reflectivities of GaN nano-pillar structures are investigated for heights of 350nm, 550nm and 720 nm. Calculations based on rigorous coupled-wave analysis show excellent agreement with the measured reflectivities for s- and p-polarizations. (c) 2008 Optical Society of America
Broadband and omnidirectional antireflection employing disordered GaN nanopillars
(2008-06-09)
Chiu, C. H.
;
Yu, Peichen
;
Kuo, H. C.
;
Chen, C. C.
;
Lu, T. C.
Disordered GaN nanopillars of three different heights: 300, 550, and 720 nm are fabricated, and demonstrate broad angular and spectral anti-reflective characteristics, up to an incident angle of 60 degrees and for the wavelength range lambda=300-1800nm. An algorithm based on a rigorous coupled-wave analysis (RCWA) method is developed to investigate the correlations between the reflective characteristics and the structural properties of the nanopillars. The broadband and omnidirectional antireflection arises mainly from the refractive-index gradient provided by nanopillars. Calculations show excellent agreement with the measured reflectivities for both s- and p-polarizations. (c) 2008 Optical Society of America.
Characteristics of a-plane GaN with the SiN(x) insertion layer grown by metal-organic chemical vapor deposition
(2008-11-15)
Ko, T. S.
;
Wang, T. C.
;
Huang, H. M.
;
Chen, J. R.
;
Chen, H. G.
We utilized in-situ-grown SiN(x) insertion layers to mitigate part of dislocations stretching in nonpolar a-plane GaN films using metal-organic chemical vapor deposition. Both X-ray diffraction (XRD) and atomic force microscopy (AFM) measurements revealed that better crystal quality and smoother surface could be obtained when the in-situ SiN(x) layer was inserted closer to the r-plane sapphire substrate and indicated that the in-situ SiN(x) insertion layer could suppress dislocations caused by lattice mismatch between the sapphire and epitaxial layers. In addition, photoluminescence and cathodoluminescence measurements confirmed the effect of the in-situ SiN(x) insertion layer on the optical properties of the improved a-plane GaN thin film, which is consistent with the XRD and AFM analyses and suggested reduction in the density of nonradiative centers. (C) 2008 Elsevier B.V. All rights reserved.
Characteristics of a-plane GaN with the SiNx insertion layer grown by metal-organic chemical vapor deposition
(2008-11-15)
Ko, T. S.
;
Wang, T. C.
;
Huang, H. M.
;
Chen, J. R.
;
Chen, H. G.
We utilized in-situ-grown SiNx insertion layers to mitigate part of dislocations stretching in nonpolar a-plane GaN films using metal-organic chemical vapor deposition. Both X-ray diffraction (XRD) and atomic force microscopy (AFM) measurements revealed that better crystal quality and smoother surface could be obtained when the in-situ SiNx layer was inserted closer to the r-plane sapphire substrate and indicated that the in-situ SiNx insertion layer could suppress dislocations caused by lattice mismatch between the sapphire and epitaxial layers. In addition, photoluminescence and cathodoluminescence measurements confirmed the effect of the in-situ SiNx insertion layer on the optical properties of the improved a-plane GaN thin film, which is consistent with the XRD and AFM analyses and suggested reduction in the density of nonradiative centers. (C) 2008 Elsevier B.V. All rights reserved.
Characteristics of efficiency droop in GaN-based light emitting diodes with an insertion layer between the multiple quantum wells and n-GaN layer
(2010-12-20)
Chang, S. P.
;
Wang, C. H.
;
Chiu, C. H.
;
Li, J. C.
;
Lu, Y. S.
We have studied the characteristics of efficiency droop in GaN-based light emitting diodes (LEDs) with different kinds of insertion layers (ILs) between the multiple quantum wells (MQWs) layer and n-GaN layer. By using low-temperature (LT) (780 degrees C) n-GaN as IL, the efficiency droop behavior can be alleviated from 54% in reference LED to 36% from the maximum value at low injection current to 200 mA, which is much smaller than that of 49% in LED with InGaN/GaN short-period superlattices layer. The polarization field in MQWs is found to be smallest in LED with InGaN/GaN SPS layer. However, the V-shape defect density, about 5.3 x 10(8) cm(-2), in its MQWs region is much higher than that value of 2.9 x 108 cm(-2) in LED with LT n-GaN layer, which will lead to higher defect-related tunneling leakage of carriers. Therefore, we can mainly assign this alleviation of efficiency droop to the reduction of dislocation density in MQWs region rather than the decrease of polarization field. (C) 2010 American Institute of Physics. [doi:10.1063/1.3531957]
Characteristics of emission polarization in a-plane nanorods embedded with InGaN/GaN multiple quantum wells
(2010-09-15)
Li, J. C.
;
Lu, T. C.
;
Huang, H. M.
;
Chan, W. W.
;
Kuo, H. C.
Nonpolar (a-plane) GaN nanorod arrays with embedded In(x)Ga(1-x)N/GaN (x=0.09, 0.14, 0.24, and 0.30) multiple quantum wells (MQWs) grown on r-plane sapphire have been fabricated successfully by self-assembled Ni nanomasks and subsequent inductively coupled plasma reactive-ion etching. After nanorod fabrications, the polarization ratio of the emission from MQWs with lower indium composition (x=0.09 and 0.14) slightly decreases but apparently increases by at most 79% for the samples with higher indium composition (x=0.24 and 0.30). Competition between the effect of multiple scattering, strain relaxation and reduction in localized centers, expected in a-plane MQW samples, are attributed to the variations in the polarization ratios after the nanorod formation. (c) 2010 American Institute of Physics. [doi:10.1063/1.3483239]
Characteristics of emission polarization in a-plane nanorods embedded with InGaN/GaN multiple quantum wells
(2010-09-15)
Li, J. C.
;
Lu, T. C.
;
Huang, H. M.
;
Chan, W. W.
;
Kuo, H. C.
Nonpolar (a-plane) GaN nanorod arrays with embedded In(x)Ga(1-x)N/GaN (x=0.09, 0.14, 0.24, and 0.30) multiple quantum wells (MQWs) grown on r-plane sapphire have been fabricated successfully by self-assembled Ni nanomasks and subsequent inductively coupled plasma reactive-ion etching. After nanorod fabrications, the polarization ratio of the emission from MQWs with lower indium composition (x=0.09 and 0.14) slightly decreases but apparently increases by at most 79% for the samples with higher indium composition (x=0.24 and 0.30). Competition between the effect of multiple scattering, strain relaxation and reduction in localized centers, expected in a-plane MQW samples, are attributed to the variations in the polarization ratios after the nanorod formation. (c) 2010 American Institute of Physics. [doi:10.1063/1.3483239]
Characterization and Monte Carlo analysis of secondary electrons induced program disturb in a buried diffusion bit-line SONOS flash memory
(2007)
Tang, Chun-Jung
;
Li, C. W.
;
Wang, Tahui
;
Gu, S. H.
;
Chen, P. C.
A new program disturb in a buried diffusion bit-line SONOS array is observed as a bit-line width is reduced. A multi-step Monte Carlo simulation is performed to explore the disturb mechanism. We find that the V, shift of a disturbed cell is attributed to impact ionization-generated secondary electrons in a neighboring cell when it is in programming. The effects of substrate bias, bit-line dimension and pocket implant on the program disturb are characterized and evaluated by a Monte Carlo simulation.
Chip-Level Characterization and RTN-Induced Error Mitigation beyond 20nm Floating Gate Flash Memory
(2018-01-01)
Lin, T. W.
;
Ku, S. H.
;
Cheng, C. H.
;
Lee, C. W.
;
Ijen-Huang
Vt instability caused by random telegraph noise (RTN) in floating gate flash memories beyond 20nm is studied comprehensively. Experiments reveal that the RTN would cause Vt distribution with a kinked tail which re-distributes to a "Gaussian-like" shape rapidly and was measured by the self established Budget Product Tester (BPT). A Multi-Times Verify (MTV) algorithm to mitigate the statistical tail, thus enlarging operation window is also exhibited by BPT. In further, a probability model to portray the compact Vt distribution under MTV is proposed. Finally, the impact of MTV on lowering the requirement of Error-correcting code (ECC) bit is also demonstrated.
Density-dependent energy relaxation of hot electrons in InN epilayers
(2009-01-01)
Yang, M. D.
;
Liu, Y. W.
;
Shen, J. L.
;
Chen, C. W.
;
Chi, G. C.
This work investigates the dependence of the hot-electron energy relaxation in InN epilayers on electron density. From the high-energy tail of photoluminescence, the electron temperature of the hot electrons was determined. Acoustic phonons have an important role in the energy relaxation of the hot electrons. The density-dependent electron energy loss rate in InN can be explained by a combination of longitudinal optical and acoustic phonon emissions. A slowing of energy loss rate at high electron densities was observed and attributed to piezoelectric coupling to acoustic phonons. (C) 2009 American Institute of Physics. [DOI: 10.1063/1.3056383]
Design and fabrication of a InGaN vertical-cavity surface-emitting laser with a composition-graded electron-blocking layer
(2014-08-01)
Lin, B. C.
;
Chang, Y. A.
;
Chen, K. J.
;
Chiu, C. H.
;
Li, Z. Y.
In this study, the design and fabrication of a InGaN vertical-cavity surface-emitting laser (VCSEL) with a composition-graded electron blocking layer (GEBL) are revealed experimentally and theoretically. It has been demonstrated that laser output performance is improved by using a GEBL when compared to the typical VCSEL structure of a rectangular EBL. The output power obtained at 20 kA cm(-2) is enhanced by a factor of 3.8 by the successful reduction of threshold current density from 12.6 to 9.2 kA cm(-2) and the enlarged slope efficiency. Numerical simulation results also suggest that the improved laser output performances are due mainly to the reduction of electron leakage current and the enhanced hole injection efficiency in the multiple-quantum-well (MQW) active region.